tag: 5nm

7/5nm Timing Closure Intensifies
By Ann Mutschler - 25 Jan, 2018 - Comments: 1

Timing closure issues are increasing in magnitude at 7/5nm, and ones that were often considered minor in the past no longer can be ignored. Timing closure is an essential part of any chip design. The process ensures that all combinatorial paths through a design meet the necessary timing so that it can run reliably at a specified clock rate. Timing closure hasn't changed significantly over th... » read more

Nodes Vs. Nodelets
By Mark LaPedus - 22 Jan, 2018 - Comments: 0

Foundries are flooding the market with new nodes and different process options at existing nodes, spreading confusion and creating a variety of challenges for chipmakers. There are full-node processes, such as 10nm and 7nm, with 5nm and 3nm in R&D. But there also is an increasing number of half-nodes or "node-lets" being introduced, including 12nm, 11nm, 8nm, 6nm and 4nm. Node-lets ar... » read more

The Future Of FinFETs
By Ed Sperling - 18 Jan, 2018 - Comments: 0

The number of questions about finFETs is increasing—particularly, how long can they continue to be used before some version of gate-all-around FET is required to replace them. This discussion is confusing in many respects. For one thing, a 7nm finFET for TSMC or Samsung is not the same as a 7nm finFET for Intel or GlobalFoundries. There are a bunch of other nodes being proposed, as well, i... » read more

E-beam Inspection Makes Inroads
By Mark LaPedus - 18 Jan, 2018 - Comments: 4

E-beam inspection is gaining traction in critical areas in fab production as it is becoming more difficult to find tiny defects with traditional methods at advanced nodes. Applied Materials, ASML/HMI and others are developing new e-beam inspection tools and/or techniques to solve some of the more difficult defect issues in the fab. [gettech id="31057" t_name="E-beam"] inspection is one of tw... » read more

Follow The Moving Money
By Ed Sperling - 18 Jan, 2018 - Comments: 1

Semiconductor economics are changing by market, by region, and by product node and packaging type, adding new complexity into decisions about which technology to use for which products and why. Money is the common denominator in all of these decisions, whether it's measured by return on invested capital, quarterly profits, or long-term investments that can include acquisitions, organic growt... » read more

Tech Talk: 7nm Process Variation
By Ed Sperling - 17 Jan, 2018 - Comments: 0

Ankur Gupta, director of field applications at ANSYS, discusses process variation and the problems it can cause at 10/7nm and beyond. https://youtu.be/WHNjFr1Da6s » read more

The Next 5 Years Of Chip Technology
By Ed Sperling - 15 Jan, 2018 - Comments: 1

Semiconductor Engineering sat down to discuss the future of scaling, the impact of variation, and the introduction of new materials and technologies, with Rick Gottscho, CTO of [getentity id="22820" comment="Lam Research"]; Mark Dougherty, vice president of advanced module engineering at [getentity id="22819" comment="GlobalFoundries"]; David Shortt, technical fellow at [getentity id="22876" co... » read more

What the Experts Think
By Sandra Liu - 20 Dec, 2017 - Comments: 0

Coventor recently sponsored an expert panel discussion at IEDM 2017 to discuss how we might advance the semiconductor industry into the next generation of technology. The panel discussed alternative methods to solve fundamental problems of technology scaling, using advances in semiconductor architectures, patterning, metrology, advanced process control, variation reduction, co-optimization and ... » read more

Will Fab Tool Boom Cycle Last?
By Mark LaPedus - 18 Dec, 2017 - Comments: 2

Fab equipment spending is on pace for a record year in 2017, and it now appears that momentum could continue into 2018. Fab tool vendors found themselves in the midst of an unexpected boom cycle in 2017, thanks to enormous demand for equipment in [getkc id="208" comment="3D NAND"] and, to a lesser degree, [getkc id="93" kc_name="DRAM"]. In the logic/foundry business, however, equipment deman... » read more

Process Window Discovery And Control
By Andrew Cross - 18 Dec, 2017 - Comments: 0

With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design node and beyond. They also are investing significant development effort in readying EUV lithography for production at the 7/5nm design nodes. Additionally, semiconductor manufacturers’ use of desi... » read more

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