IP Requires System Context At 6/5/3nm

By Ann Mutschler - 01 May, 2019 - Comments: 0

Driven by each successive generation of semiconductor manufacturing technology, complexity has reached dizzying levels. Every part of the design, verification and manufacturing is more complicated and intense the more transistors are able to be packed onto a die. For these reasons, the entire system must be taken into consideration as a whole – not just as individual building blocks as could ... » read more

Focus Shifting From 2.5D To Fan-Outs For Lower Cost

By Ed Sperling - 29 Apr, 2019 - Comments: 0

Semiconductor Engineering sat down to discuss advanced packaging with Calvin Cheung, vice president of engineering at ASE; Walter Ng, vice president of business management at UMC; Ajay Lalwani, vice president of global manufacturing operations at eSilicon; Vic Kulkarni, vice president and chief strategist in the office of the CTO at ANSYS; and Tien Shiah, senior manager for memory at Samsung. W... » read more

Controlling IC Manufacturing Processes For Yield

By Ed Sperling - 24 Apr, 2019 - Comments: 0

Equipment and tools vendors are starting to focus on data as a means of improving yield, adding more sensors and analysis capabilities into the manufacturing flow to circumvent problems in real time. How much this will impact the cost of developing complex chips at leading-edge nodes, and in 2.5D and 3D-IC packages, remains to be seen. But the race to both generate data during manufacturing ... » read more

Lithography Options For Next-Gen Devices

By Mark LaPedus - 18 Apr, 2019 - Comments: 2

Chipmakers are ramping up extreme ultraviolet (EUV) lithography for advanced logic at 7nm and/or 5nm, but EUV isn’t the only lithographic option on the table. For some time, the industry has been working on an assortment of other next-generation lithography technologies, including a new version of EUV. Each technology is different and aimed at different applications. Some are here today, w... » read more

Moore’s Law Now Requires Advanced Packaging

By Ed Sperling - 18 Apr, 2019 - Comments: 0

More Memory And Processor Tradeoffs

By Ed Sperling - 11 Apr, 2019 - Comments: 0

Creating a new chip architecture is becoming an increasingly complex series of tradeoffs about memories and processing elements, but the benefits are not always obvious when those tradeoffs are being made. This used to be a fairly straightforward exercise when there was one processor, on-chip SRAM and off-chip DRAM. Fast forward to 7/5nm, where chips are being developed for AI, mobile ph... » read more

Low Power Meets Variability At 7/5nm

By Ann Mutschler - 11 Apr, 2019 - Comments: 0

Power-related issues are beginning to clash with process variation at 7/5nm, making timing closure more difficult and resulting in re-spins caused by unexpected errors and poor functional yield. Variability is becoming particularly troublesome at advanced nodes, and there are multiple causes of that variability. One of the key ones is the manufacturing process, which can be affected by every... » read more

The 7nm Pileup

By Ed Sperling - 04 Apr, 2019 - Comments: 1

The number of 7nm designs is exploding. Cadence alone reports 80 new 7nm chips under design. So why now, and what does this all mean? First of all, 7nm appears to be the next 28nm. It's a major node, and it intersects with a number of broad trends that are happening across the industry, all of which involve AI in one way or another. The big question now is how many of them will survive long ... » read more

Billion-Gate Design Connectivity

By Ed Sperling - 27 Mar, 2019 - Comments: 0

Sasa Stamenkovic, senior field application engineer at OneSpin Solutions, explains how to find and resolve connectivity issues in integrating large numbers of components in very big designs, often at the leading edge nodes and in markets such as AI. » read more

Improving SAQP Patterning Yield Using Virtual Fabrication And Advanced Process Control

By Benjamin Vincent - 25 Mar, 2019 - Comments: 0

Advanced logic scaling has created some difficult technical challenges, including a requirement for highly dense patterning. Imec recently confronted this challenge, by working toward the use of Metal 2 (M2) line patterning with a 16 nm half-pitch for their 7nm node (equivalent to a 5nm foundry node). Self-Aligned Quadruple Patterning (SAQP) was investigated as an alternative path to Extreme Ul... » read more

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