2.5D Integration: Big Chip Or Small PCB?


Defining whether a 2.5D device is a printed circuit board shrunk down to fit into a package, or is a chip that extends beyond the limits of a single die, may seem like hair-splitting semantics, but it can have significant consequences for the overall success of a design. Planar chips always have been limited by size of the reticle, which is about 858mm2. Beyond that, yield issues make the si... » read more

Commercial Chiplet Ecosystem May Be A Decade Away


Experts at the Table: Semiconductor Engineering sat down to talk about the challenges of establishing a commercial chiplet ecosystem with Frank Schirrmeister, vice president solutions and business development at Arteris; Mayank Bhatnagar, product marketing director in the Silicon Solutions Group at Cadence; Paul Karazuba, vice president of marketing at Expedera; Stephen Slater, EDA product mana... » read more

Navigating IoT Security


By Dana Neustadter (Synopsys), Ruud Derwig (Synopsys), and Martin Rösner (G+D) IoT expansion requires secure and efficient connectivity between machines. Integrated SIM technology and remote SIM provisioning can make this possible. Subscriber Identity Module (SIM) cards have been around for a long time, with Giesecke+Devrient (G+D) developing and delivering the first commercial SIM car... » read more

Blog Review: Feb. 28


Synopsys' Emilie Viasnoff suggests that employing virtual sensors when developing an autonomous driving system helps aid in sensor design and minimizes the hazards associated with extensive real-world driving. Cadence's Anthony Ducimo introduces a methodology for embedded BootROM verification that relies only on standard RTL verification toolchains to reveal bugs, identify unused sections of... » read more

Advanced Design Planning In IC Compiler II


By Rajiv Dave, CAE Manager, Synopsys. Design exploration and planning is becoming an increasingly critical step of the design creation process as growing constraints and requirements are placed upon it. IC Compiler II has been architected from the ground up with the express focus to address the three key challenges of design planning: Capacity to handle the largest design optimally yet ... » read more

Thinking Big: From Chips To Systems


Semiconductor Engineering sat down with Aart de Geus, executive chair and founder of Synopsys, to talk about the shift from chips to systems, next-generation transistors, and what's required to build multi-die devices in the context of rapid change and other systems. SE: What are the biggest changes you're seeing in the chip industry these days, and why now? de Geus: It's not just the siz... » read more

Chip Industry Week In Review


By Jesse Allen, Gregory Haley, and Liz Allan Intel officially launched Intel Foundry this week, claiming it's the "world's first systems foundry for the AI era." The foundry also showed off a more detailed technology roadmap down to expanded 14A process technology. Intel CEO Pat Gelsinger noted the foundry will be separate from the chipmaker, utilize third-party chiplets and IP, and leverage... » read more

Intel, And Others, Inside


Intel this week made a strong case for how it will regain global process technology leadership, unfurling an aggressive technology and business roadmap that includes everything from several more process node shrinks that ultimately could scale into the single-digit angstrom range to a broad shift in how it approaches the market. Both will be essential for processing the huge amount of data for ... » read more

Utilizing Artificial Intelligence For Efficient Semiconductor Manufacturing


The challenges before semiconductor fabs are expansive and evolving. As the size of chips shrinks from nanometers to eventually angstroms, the complexity of the manufacturing process increases in response. It can take hundreds of process steps and more than a month to process a single wafer. It can subsequently take more than another month to go through the assembly, testing, and packaging st... » read more

Computational Lithography Solutions To Enable High NA EUV


This white paper identifies and discusses the computational needs required to support the development, optimization, and implementation of high NA extreme ultraviolet (EUV) lithography. It explores the challenges associated with the increased complexity of high NA systems, proposes potential solutions, and highlights the importance of computational lithography in driving the success of advanced... » read more

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