Chip Industry Technical Paper Roundup: Nov. 26


New technical papers recently added to Semiconductor Engineering’s library: [table id=494 /] Find more semiconductor research papers here. » read more

Advantages Of IPL Soldering Over Reflow Soldering For Cu Pillar Bump Interconnections On Glass Substrates (Chungbuk, Sungkyunkwan Univ.)


A new technical paper titled "Ultrafast Semiconductor Chip Bonding Using Intense Pulsed Light Soldering for Chip-on-Glass Packaging" was published by researchers at Sungkyunkwan University and Chungbuk National University. Abstract: "The increasing demand for miniaturization and improved performance in electronic devices has driven the exploration of glass substrates and advanced soldering ... » read more

Chip Industry Technical Paper Roundup: July 22


New technical papers recently added to Semiconductor Engineering’s library: [table id=456 /] Find more semiconductor research papers here.   » read more

Chip Industry Week in Review


The U.S. government will grant licenses to NVIDIA and AMD to again sell some AI chips — NVIDIA's H20 GPU and AMD's MI308 — to Chinese companies. TrendForce projects that the availability of NVIDIA chips, in particular, will create a surge in demand from Chinese AI firms and cloud service providers, and boost high-bandwidth memory (HBM) consumption. The move could raise China’s share of... » read more

Examination Of Thermal Issues Related to Hybrid Bonding of 3D-Stacked HBM


A new technical paper titled "Thermal Issues Related to Hybrid Bonding of 3D-Stacked High Bandwidth Memory: A Comprehensive Review" was published by researchers at Chungbuk National University. Abstract "High-Bandwidth Memory (HBM) enables the bandwidth required by modern AI and high-performance computing, yet its three dimensional stack traps heat and amplifies thermo mechanical stress. We... » read more

Research Bits: April 4


Wet-like plasma etching Researchers from Nagoya University and Hitachi developed a new etch method called wet-like plasma etching that combines the selectivity of wet etching with the controllability of dry etching. The researchers say the technique will make it possible to etch complex structures such as metal carbides consisting of titanium (Ti) and aluminum (Al), such as TiC or TiAlC, wh... » read more

Inner Spacer Engineering to Improve Mechanical Stability in Channel-Release Process of Nanosheet FETs


  Abstract "Mechanical stress is demonstrated in the fabrication process of nanosheet FETs. In particular, unwanted mechanical instability stemming from gravity during channel-release is covered in detail by aid of 3-D simulations. The simulation results show the physical weakness of suspended nanosheets and the impact of nanosheet thickness. Inner spacer engineering based on geometr... » read more

Stacked Nanosheets And Forksheet FETs


What comes next after gate-all-around FETs is still being worked out, but it likely will involve some version of stacked nanosheets. The design of advanced transistors is a tradeoff. On one hand, it takes less gate capacitance to control a thin channel. On the other hand, thin channels can’t carry as much drive current. Stacked nanosheet designs seek to reconcile these two objectives by... » read more