tag: D2S

Luminaries See Growth Opportunities For Photomask Writers
By Jan Willis - 20 Jan, 2022 - Comments: 0

Multi-beam mask writers (MBMWs) are the new kid on the block of the photomask writers, so growth predictions aren’t surprising. In fact, 90% of the industry luminaries surveyed by the eBeam Initiative think that new MBMW purchases will increase over the next three years, as shown in figure 1. Looking at that chart, industry luminaries predict sales of new photomask writers to increase across ... » read more

2021 Top Tech Videos
By Linda Christensen - 28 Dec, 2021 - Comments: 0

While the world’s chip shortage dominated the 2021 headlines, the semiconductor industry blazed new trails with the increased electrification of cars, focused AI applications, improving power/performance, better utilization of data deluges, dealing with design challenges in advanced nodes and much more focus on chip security. Semiconductor Engineering’s Tech Talks reflected these focus a... » read more

Perspectives On Why EUV Photomasks Are More Expensive
By Jan Willis - 20 Dec, 2021 - Comments: 0

There are fewer photomasks per wafer using EUV lithography, but each EUV photomask is more expensive. Given that, it’s not a surprise that a majority (74%) of industry luminaries surveyed in July say that EUV photomasks will contribute to an increase in photomask revenues for 2021 as shown in figure 1. In a 20-minute video, a panel of experts share their perspectives on what drives EUV photom... » read more

Business, Technology Challenges Increase For Photomasks
By Mark LaPedus - 16 Dec, 2021 - Comments: 0

Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; Peter Buck, director of MPC & mask defect management at Siemens Digital Industries Software; Bryan Kasprowicz, senior director of technical strategy at Hoya; and Aki Fujimura, CEO of D2S. What f... » read more

China Accelerates Foundry, Power Semi Efforts
By Mark LaPedus - 22 Nov, 2021 - Comments: 4

China has unveiled several initiatives to advance its domestic semiconductor industry, including a new and massive fab expansion campaign in the foundry, gallium-nitride (GaN), and silicon carbide (SiC) markets. The nation is making a big push into what it calls “third-generation semiconductors,” which is a misnomer. The term actually refers to two existing and common power semiconductor... » read more

Semiconductor Photomask Revenues Predicted To Increase In 2021
By Jan Willis - 18 Nov, 2021 - Comments: 0

A majority (72%) of industry luminaries surveyed in July predict an increase in photomask revenues for 2021, as shown in figure 1. SEMI also predicts revenues to increase around 9% from $4.4B in 2020 to $4.8B in 2021. In a 12-minute video, a panel of experts share their perspectives on what’s behind the growth trend, how the pandemic has impacted the photomask industry, and how it compares to... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 12 Nov, 2021 - Comments: 0

Chipmakers AMD has rolled out its new MI200 series products, the first exascale-class GPU accelerators. Using a fan-out bridge packaging technology, the MI200 series are designed for high-performance computing (HPC) and artificial intelligence (AI) applications. The MI200 series accelerators feature a multi-die GPU architecture with 128GB of HBM2e memory. Typically, the HBM2e memory stack a... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 05 Nov, 2021 - Comments: 0

Packaging Amkor plans to build a packaging plant in Bac Ninh, Vietnam. The first phase of the new factory will focus on providing system-in-package (SiP) assembly and test services for customers. The investment for the first phase of the facility is estimated to be between $200 million and $250 million. “This is a strategic, long-term investment in geographical diversification and factory... » read more

Curvilinear Design Benefits For Wafers
By Jan Willis - 21 Oct, 2021 - Comments: 0

Throughout this blog series the focus has been on curvilinear photomasks – the benefits, enablers, and challenges. It leads to the obvious question that Aki Fujimura, CEO of D2S, put to the panel of luminaries. If leading-edge mask shops are ready for curvilinear shapes on mask enabled by curvilinear ILT, multi-beam mask writers and the mask design chain, can we have curvilinear target shapes... » read more

Gearing Up For High-NA EUV
By Mark LaPedus - 21 Oct, 2021 - Comments: 2

The semiconductor industry is moving full speed ahead to develop high-NA EUV, but bringing up this next generation lithography system and the associated infrastructure remains a monumental and expensive task. ASML has been developing its high-numerical aperture (high-NA) EUV lithography line for some time. Basically, high-NA EUV scanners are the follow-on to today’s EUV lithography systems... » read more

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