tag: eBeam Initiative

Conquering Heat Issues In e-beam Lithography
By eBeam Initiative - 18 Jun, 2015 - Comments: 0

By Noriaki Nakayamada What's the best way to deal with the menacing heating effects in VSB mask writing? The answer lies in part on leveraging GPU acceleration. Check out this video on what's ahead for multi-beam mask writing. [youtube vid=Ij2l3hk6aFg] —Noriaki Nakayamada is group manager at NuFlare Technology. » read more

The Week In Review: Manufacturing
By Mark LaPedus - 20 Feb, 2015 - Comments: 0

For years, chipmakers have attempted to build fabs in India. So far, however, India has failed to set up modern fabs and for good reason. There are issues in terms of obtaining dependable power and water for a fab in India, according to Will Strauss, president of Forward Concepts, who added that India also suffers from government bureaucracy. India is still trying. Last week, Cricket Semicon... » read more

Tech Talk: Inverse Lithography
By Ed Sperling - 11 Dec, 2014 - Comments: 0

D2S’ Leo Pang talks with Semiconductor Engineering about lithography, inverse lithography, photomasks, where the problems are, and what needs to be done to move forward. [youtube vid=mn8JWaP8Z68] » read more

Blog Review: Oct. 22
By Ed Sperling - 22 Oct, 2014 - Comments: 0

What is UX? The User Experience, of course. Rambus' Aharon Etengoff notes that the IoT UX is now the subject of a Harvard Business Review article. A long list of hurdles are expected at the 10nm process node, including multiple levels of local interconnects, more complex layout rules, timing problems, and a slew of others. Cadence's Richard Goering puts it all in perspective. Mentor's R... » read more

Executive Insight: Aki Fujimura
By Mark LaPedus - 16 Oct, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss photomask technology and lithography trends with Aki Fujimura, chairman and chief executive of D2S. SE: What are the big challenges that keep you awake at night? Fujimura: Mask technology, and the investments in the mask industry, are increasingly important. But so far, the investment dollars that the community is willing to spend on it isn’... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 19 Sep, 2014 - Comments: 0

Gartner predicts that by 2016 smartwatches will comprise about 40% of consumer wristworn devices. Gartner said that nine out of the top 10 smartphone vendors have entered the wearables market to date or are about to ship a first product, while a year ago only two vendors were in that space. The eBeam Initiative announced the completion of its third annual survey. In one of the highlights of ... » read more

2014 eBeam Survey Results
By eBeam Initiative - 18 Sep, 2014 - Comments: 0

An industry-wide poll highlights what the industry is thinking about EUV and mask writing at advanced nodes. To view the poll, click here. » read more

One-On-One: Linyong Pang
By Mark LaPedus - 12 May, 2014 - Comments: 1

Semiconductor Engineering sat down to discuss trends in the lithography and photomask business with Linyong “Leo” Pang, the new chief product officer and executive vice president at D2S, which focuses on model-based mask data preparation as well as other mask writing technologies. What follows are excerpts of that conversation. SE: Before you arrived at D2S you were at Luminescent, whic... » read more

Blog Review: April 30
By Ed Sperling - 30 Apr, 2014 - Comments: 0

Applied Materials’ Jeremy Read points to a looming problem for the Internet of Things—legacy fabs that will require software upgrades and advanced process control. Also needed: Sensors attached to thousands of machines for predictive maintenance. Foundries are now ready for production finFETs. Cadence's Richard Goering captures the buzz at last week’s TSMC Tech Symposium, where the ro... » read more

Stopping Mask Hotspots Before They Escape The Mask Shop
By eBeam Initiative - 28 Apr, 2014 - Comments: 3

By Aki Fujimura The same types of physics-based issues that have haunted lithography for decades have started to impact mask writing as well. The increasingly small and complex mask shapes specified by optical proximity correction (OPC) that are now required for faithful wafer lithography at 28nm-and-below nodes have given rise to an increase in mask hotspots. Mask hotspots occur when the shap... » read more

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