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A Comparative Analysis of Computer-Aided Design Tools for Complex Power Electronics Systems


Abstract: "Companies working on semiconductors must currently assure the customers of not only the performance of the semiconductor device per se, but also its performance when it is implemented in a real board, therefore including the role of parasitic effects. It is therefore very important to evaluate, especially during the design phase, not only the single device, but the complete board ... » read more

The Physics Of Ports And Associated Ground For EM Simulators Serving RF Designs


The use of ports in electromagnetic (EM) simulators has evolved and matured over the years to make real-world design simulations practical. Having a foundational understanding of ports provides an intuitive skill in their proper selection and use in conjunction with circuit simulation. In this white paper, we examine ports common to EM simulators, which are the most common simulators for microw... » read more

Best Practices For Efficient And Effective Planar EM Simulation


Designers of today’s complex, multi-featured communications products require accurate and fast electromagnetic (EM) simulation to deliver cost-effective, high-performance products to market in ever-shrinking windows of opportunity. The Cadence AWR AXIEM 3D planar method-of-moments (MoM) EM analysis simulator within the AWR software portfolio delivers the accuracy, capacity, and speed designer... » read more

Faster Than Moore’s Law: Exponential Innovation In Electromagnetic Simulation


Moore’s Law is the most iconic statement of exponential technology advancement, doubling transistor count and hence functional performance every 24 months. Many pundits [1-3] have observed that while technology advancement is exponential, human expectations are linear. We often fail to anticipate when a technology may arrive in short order. Electromagnetic simulation has delivered exponential... » read more

EUV Reticle Print Verification With Advanced Broadband Optical Wafer Inspection And e-Beam Review Systems


As the Extreme Ultraviolet (EUV) lithography ecosystem is being actively mapped out to enable sub-7nm design rule devices, there is an immediate and imperative need to identify the EUV reticle (mask) inspection methodologies. The introduction of additional particle sources due to the vacuum system and potential growth of haze defects or other film or particle depositions on the reticle, in comb... » read more