Inside Lithography And Masks


Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; David Fried, chief technology officer at [getentity id="22210" e_name="Cove... » read more

The Week In Review: Manufacturing


Chipmakers At an event, Intel’s Technology and Manufacturing group outlined the company's vision. As part of the event, Intel reiterated what many are saying—the current node designations are meaningless and misleading. “For example, Intel estimates that its 14nm solution that has been out in the market since 2014 should be equal to 10nm solutions released by competitors in the near futu... » read more

IoT Security Risks Grow


Semiconductor Engineering sat down to discuss security issues with Asaf Shen, vice president of marketing for security IP in [getentity id="22186" e_name="ARM's"] Systems & Software Group; Timothy Dry, principal staff marketing manager for the Industrial IoT segment at [getentity id="22819" comment="GlobalFoundries"]; Chowdary Yanamadala, senior vice president of business development at Cha... » read more

Patterning Problems Pile Up


Chipmakers are ramping up 16nm/14nm finFET processes, with 10nm and 7nm now moving into early production. But at 10nm and beyond, chipmakers are running into a new set of problems. While shrinking feature sizes of a device down to 10nm, 7nm, 5nm and perhaps beyond is possible using current and future fab equipment, there doesn't seem to be a simple way to solve the edge placement error (EPE)... » read more

The Week In Review: Manufacturing


Chipmakers At this week’s TSMC Technology Symposium in San Jose, Calif., TSMC rolled out a dizzying array of new processes and technologies. Perhaps the most surprising announcement was a 22nm bulk CMOS process, which is geared for ultra low-power planar chips. The technology will compete against a 22nm FD-SOI technology from GlobalFoundries. Stay tuned. The battle has just begun. As e... » read more

Inside Lithography And Masks


Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; David Fried, chief technology officer at [getentity id="22210" e_name="Cove... » read more

China: Fab Boom or Bust?


China’s semiconductor industry continues to expand at a frenetic pace. At present there are nearly two dozen new fab projects in China. Whether all these fab projects get off the ground is not entirely clear because the dynamics in China remain fluid. What is clear is the motivation behind this building frenzy—China is trying to reduce its huge trade imbalance in ICs. The country continu... » read more

The Week In Review: Manufacturing


Fab tools In response to SEMI members and partners, SEMI says it is not organizing Semicon Russia 2017, or any other events in Russia this year. “In light of the current market conditions and SEMI stakeholder concerns, SEMI reached out to members and customers over the last six months to assess how to provide the most value for our community in Russia,” said Laith Altimime, president of SE... » read more

The Week In Review: Design


SoftBank plans to sell a 25% stake in ARM to Vision Fund, a $100 billion technology fund created last year by SoftBank and Saudi Arabia's Public Investment Fund. SoftBank and Saudi Arabia are investing $25 billion and $45 billion in the fund, respectively. Another potential major player is Mubadala Development Co., the government-owned Abu Dhabi investment firm which owns GlobalFoundries and, a... » read more

The Week In Review: Manufacturing


SPIE news At this week’s SPIE Advanced Lithography conference, the industry paid close attention to the progress of extreme ultraviolet (EUV) lithography. Here’s the general report card: EUV is making noticeable progress, but there are still some challenges ahead, such as the power source, resists and pellicles. Several issues need to be resolved before chipmakers can put EUV into mass... » read more

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