Interconnect Troubles

By Applied Materials Writers - 13 Dec, 2012 - Comments: 0

By Mehul Naik These days, transistor scaling is driving some of the most exciting innovations in device architecture and getting lots of attention as a result. What may be less obvious is the cascading effect transistor scaling is having on the interconnect. The biggest challenges result directly from pitch reduction required to support the increasing functionality. These include poor pattern ... » read more

Interconnect Performance In The Spotlight

By Applied Materials Writers - 04 Dec, 2012 - Comments: 0

By Richard Lewington Are you going to be in the San Francisco area on December 11th? We're hosting a forum to explore the path that interconnect technology must take to keep pace with transistor scaling and the transition to new 3D architectures. Transistors get all the attention these days as the savior of Moore's Law. But there's no point making transistors faster if the wires between ... » read more

The Threat Within

By Applied Materials Writers - 16 Aug, 2012 - Comments: 0

By Connie Duncan Given that today’s advanced chips can contain billions of transistors, 60 miles of copper wiring and 10 billion vertical connections between metal layers, the challenges and potential pitfalls this level of complexity presents are mind-boggling. One major problem on the horizon at 20nm and below is the threat of voids forming in the vertical interconnects commonly called via... » read more

Flowing Copper

By Applied Materials Writers - 31 Jul, 2012 - Comments: 0

By Richard Lewington If you were to slice up a microchip and take a look (you’d need a really powerful microscope, I'm afraid) you would see what looks like a nanoscale layer cake. All the active circuit elements—transistors, memory cells, etc.—are on the bottom. The other 90% of the chip is a maze of tiny copper wires, which we call interconnects. The history of chip developme... » read more

Capping Tools Tame Electromigration

By Mark LaPedus - 31 Jul, 2012 - Comments: 0

By Mark LaPedus The shift towards the 28nm node and beyond has put the spotlight back on the interconnect in semiconductor manufacturing. In chip scaling, the big problem in the interconnect is resistance-capacitance (RC). Another, and sometimes forgotten, issue is electromigration. “Electromigration gets worse in device scaling,” said Daniel Edelstein, an IBM Fellow and manager of BE... » read more

Experts At The Table: Does 20nm Break System-Level Design?

By Ed Sperling - 13 Jul, 2012 - Comments: 1

By Ann Steffora Mutschler System-Level Design sat down to discuss design at 20nm with Drew Wingard, chief technology officer at Sonics; Kelvin Low, deputy director of product marketing at GlobalFoundries, Frank Schirrmeister, group director of product marketing for system development in the system and software realization group at Cadence; and Mike Gianfagna, vice president of marketing at Atr... » read more

The Interconnect Game

By Ed Sperling - 26 Apr, 2012 - Comments: 0

By Ed Sperling Having a single bus protocol is something most SoC engineers can only dream about. Reality is often a jumble of protocols determined by the IP they use, which can slow down a design’s progress. The problem stems largely from re-use and legacy IP. While it might be convenient to use only on an AXI standard protocol from ARM, most chips are a combination of IP tied to specif... » read more

New Processes Define New Power Plans

By Ed Sperling - 05 Apr, 2012 - Comments: 0

By Pallab Chatterjee FinFETs, stacked die, heterogeneous interposers, TSVs, 450mm wafers, new interconnects and everything with MEMs and sensors is what the last few weeks have brought. A number of major announcements, technology releases, conference updates have identified these technologies as the future of IC design. At ISQED, Robert Geer, chief academic officer at the College of Nanosca... » read more

Reducing Bottlenecks

By Ann Mutschler - 18 Nov, 2010 - Comments: 0

By Ann Steffora Mutschler For the first time ever, China recently earned fastest supercomputer bragging rights with its Tianhe-1A supercomputer, which can perform 2.57 quadrillion computing operations per second. The machine has been successfully used to survey mines, forecast weather and design high-end machinery. While it has caused concern, it is important to note that the Tianhe-1A use... » read more

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tag: interconnects