Getting Smarter About Tool Maintenance


Chipmakers have begun to shift to predictive maintenance for process tools, but the hefty investment in analytics and engineering efforts means it will take some time for smart maintenance to become a widespread practice. Semiconductor manufacturers need to maintain a diverse set of equipment to process the flow of wafers, dies, packaged parts, and boards running through factories. OSAT and ... » read more

New Challenges Emerge With High-NA EUV


High numerical aperture EUV exposure systems are coming — as soon as 2025 by some estimates. Though certainly a less profound change than the introduction of extreme ultraviolet lithography, high-NA lithography still brings a new set of challenges for photoresists and related materials. With a higher numerical aperture, photons strike the wafer at a shallower angle. That requires thinner p... » read more

A Comparative Evaluation Of DRAM Bit-Line Spacer Integration Schemes


With decreasing dynamic random-access memory (DRAM) cell sizes, DRAM process development has become increasingly difficult. Bit-line (BL) sensing margins and refresh times have become problematic as cell sizes have decreased, due to an increase in BL parasitic capacitance (Cb). The main factor impacting Cb is the parasitic capacitance between the BL and the node contact (CBL-NC) [1]. To reduce ... » read more

Chip Industry’s Technical Paper Roundup: Mar. 14


New technical papers recently added to Semiconductor Engineering’s library: [table id=86 /] If you have research papers you are trying to promote, we will review them to see if they are a good fit for our global audience. At a minimum, papers need to be well researched and documented, relevant to the semiconductor ecosystem, and free of marketing bias. There is no cost involved for us ... » read more

Virtual Process Game To Benchmark Performance of Humans And Computers For Design Of A Semiconductor Fabrication Process


A new technical paper titled "Human–machine collaboration for improving semiconductor process development" was published by researchers at Lam Research. Abstract: "One of the bottlenecks to building semiconductor chips is the increasing cost required to develop chemical plasma processes that form the transistors and memory storage cells These processes are still developed manually using h... » read more

Blog Review: March 1


Siemens EDA's Chris Spear explains the UVM Factory and how it can facilitate collaboration by enabling injection of new features without affecting your team. Cadence's Paul McLellan looks at efforts to ensure chiplets from different companies work together, particularly when the creating companies didn't pre-plan for those specific chiplets to work together, as well as the problems of failur... » read more

Week In Review: Semiconductor Manufacturing & Test


The Biden Administration’s export bans for semiconductor manufacturing equipment are delaying expansion plans for Chinese chipmakers, Nikkei Asia reports. Yangtze Memory Technologies (YMTC) has halted work on its second memory plant near Wuhan, and ChangXin Memory Technologies (CMTX) says its second production facility, slated to open in 2023, will be delayed until 2024 or 2025. In an effo... » read more

Devices And Transistors For The Next 75 Years


The 75th anniversary of the invention of the transistor sparked a lively panel discussion at IEDM, spurring debate about the future of CMOS, the role of III-V and 2D materials in future transistors, and what will be the next great memory architecture.[1] Industry veterans from the memory, logic, and research communities see high-NA EUV production, NAND flash with 1,000 layers, and hybrid bon... » read more

The Other Side Of The Wafer: The Latest Developments In Backside Power Delivery


At the beginning of my career in semiconductor equipment, the backside of the wafer was a source of anxiety. In one memorable instance in my early career, several wafers flew off a robot blade during a wafer transfer. After cleaning up the mess, we remembered that a variety of thin films could be deposited on the wafer backside, which could decrease its friction coefficient. Slowing down the wa... » read more

Blog Review: Feb. 8


Cadence's Sanjeet Kumar points to key changes and optimizations that are done for USB3 Gen T compared to USB3 Gen X tunneling in order to minimize tunnel overhead and maximize USB3 throughput. Siemens EDA's Harry Foster considers the effectiveness of IC and ASIC verification by looking at schedule overruns, number of required spins, and classification of functional bugs. Synopsys' Chris C... » read more

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