tag: TSMC

22nm Process War Begins
By Mark LaPedus - 23 Apr, 2017 - Comments: 1

Many foundry customers at the 28nm node and above are developing new chips and are exploring the idea of migrating to 16nm/14nm and beyond. But for the most part, those companies are stuck because they can’t afford the soaring IC design costs at advanced nodes. Seeking to satisfy a potential gap in the market, [getentity id="22819" comment="GlobalFoundries"], [getentity id="22846" e_name="... » read more

The Other Side Of H1-B Visas
By Katherine Derbyshire - 20 Apr, 2017 - Comments: 0

There is a lot of discussion these days about “Hire American.” But what does that actually mean in practice? I’m at the Materials Research Society Spring Meeting this week, where one of the presentations was by a scientist who works at the TEL Technology Center, America, in Albany, NY. It’s the largest Tokyo Electron research center outside of Japan. It’s affiliated with the SUNY P... » read more

Moore’s Law: A Status Report
By Ed Sperling - 20 Apr, 2017 - Comments: 3

Moore's Law has been synonymous with "smaller, faster, cheaper" for the past 52 years, but increasingly it is viewed as just one of a number of options—some competing, some complementary—as the chip industry begins zeroing in on specific market needs. This does not make [getkc id="74" comment="Moore's Law"] any less relevant. The number of companies racing from 16/14nm to 7nm is higher t... » read more

2.5D, FO-WLP Issues Come Into Focus
By Ann Mutschler - 10 Apr, 2017 - Comments: 2

Advanced packaging is beginning to take off after years of hype, spurred by 2.5D implementations in high-performance markets and fan-out wafer-level packaging for a wide array of applications. There are now more players viewing packaging as another frontier driving innovation. But perhaps a more telling sign is that large foundries in Taiwan have begun offering packaging services to customer... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 07 Apr, 2017 - Comments: 0

Mask and fab equipment Seeking to speed up the semiconductor design and manufacturing process, D2S has rolled out its fifth-generation computational design platform (CDP). D2S, a supplier of GPU-accelerated computational systems or platforms, said the latest CDP is designed to enable faster simulations for a range of applications. Using Nvidia’s Pascal-based Tesla P40 GPUs, D2S’ fifth-... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 31 Mar, 2017 - Comments: 0

Chipmakers At an event, Intel’s Technology and Manufacturing group outlined the company's vision. As part of the event, Intel reiterated what many are saying—the current node designations are meaningless and misleading. “For example, Intel estimates that its 14nm solution that has been out in the market since 2014 should be equal to 10nm solutions released by competitors in the near futu... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 17 Mar, 2017 - Comments: 0

Chipmakers At this week’s TSMC Technology Symposium in San Jose, Calif., TSMC rolled out a dizzying array of new processes and technologies. Perhaps the most surprising announcement was a 22nm bulk CMOS process, which is geared for ultra low-power planar chips. The technology will compete against a 22nm FD-SOI technology from GlobalFoundries. Stay tuned. The battle has just begun. As e... » read more

The Week In Review: Design
By Jesse Allen - 17 Mar, 2017 - Comments: 0

Business Andes Technology went public this week on the Taiwan Stock Exchange with an initial stock listing of 40,611,915 shares at a price of NT$65.10 (USD $2.12) per share. The shares began trading March 14, 2017, under the TWSE ticker symbol “6533.TWO.” Andes plans to use the proceeds to expand the company's R&D effort, to fuel international expansion into the U.S. and Europe and t... » read more

TFETs Cut Sub-Threshold Swing
By Katherine Derbyshire - 16 Mar, 2017 - Comments: 0

One of the main obstacles to continued transistor scaling is power consumption. As gate length decreases, the sub-threshold swing (SS) — the gate voltage required to change the drain current by one order of magnitude — increases. As Qin Zhang, Wei Zhao, and Alan Seabaugh of Notre Dame explained in 2006, SS faces a theoretical minimum of 60 mV/decade at room temperature in conventional MO... » read more

China: Fab Boom or Bust?
By Mark LaPedus - 16 Mar, 2017 - Comments: 2

China’s semiconductor industry continues to expand at a frenetic pace. At present there are nearly two dozen new fab projects in China. Whether all these fab projects get off the ground is not entirely clear because the dynamics in China remain fluid. What is clear is the motivation behind this building frenzy—China is trying to reduce its huge trade imbalance in ICs. The country continu... » read more

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