Automotive Week In Review


Quick links: Deals and New Chips, Batteries and BEVs, Autonomous, Policy and Research. Deals and New Chips Infineon and BMW are jointly developing software-defined vehicles based on BMW’s “Neue Klasse” architecture and Infineon’s MCUs, high-speed Ethernet solutions, power management ICs, and power switches. Tata Electronics will manufacture Qualcomm's automotive modules in I... » read more

Consumer And Med Tech Mushroom As Quantum Closes In


Key Takeaways: Universities and companies are making devices inspired by biology and the human senses to help with health monitoring, semiconductor materials development, human-computer interfaces, and more. When this nascent technology becomes a viable product, government regulations will be needed to ensure consumer safety in tracking or treating their body and the environment. Qua... » read more

Research Bits: Jan. 20


ALD for Ru wiring Researchers from Ulsan National Institute of Science and Technology (UNIST), Hongik University, and Tanaka Precious Metal Technologies developed an atomic layer deposition (ALD) process for creating chip interconnects using a ruthenium (Ru) precursor with a thermal stability up to 400 °C. The high-temperature ALD process can produce dense, high-quality Ru films without deg... » read more

Minimizing Optical Loss While Enabling Efficient Phase Modulation in TMD-Based Devices (Nanyang Technological Univ., et al.)


A new technical paper titled "Hybrid tungsten oxyselenide/graphene electrodes for near-lossless 2D semiconductor phase modulators" was published by researchers at Nanyang Technological University, CNRS-International-NTU-Thales Research Alliance (CINTRA), University of Chicago, University of Wisconsin-Madison, Chungnam National University, National Institute for Materials Science, MIT, and Singa... » read more

Annual Global IC Fabs And Facilities Report


Semiconductor companies announced a significant number of facilities in 2025 as global onshoring efforts continued across manufacturing, materials, packaging, design, and R&D. Investments came from both industry and government sources. Organizations worked together to solve current technology challenges, including soaring demand for AI chips and advanced memory, as well as complex applic... » read more

Chip Industry Week in Review


Government funding/defunding NIST is terminating funding for the SMART USA Institute, a CHIPS Act research center focused on digital twins, prompting congressional concern that the decision disrupts active awards and weakens U.S. semiconductor R&D commitments. Korea Zinc was awarded $210M in CHIPS Act funding towards a new $6.6B Tennessee advanced smelter and minerals processing facility,... » read more

Chip Industry Technical Paper Roundup: Nov. 18


New technical papers recently added to Semiconductor Engineering’s library: [table id=492 /] Find more semiconductor research papers here. » read more

3D Imaging Buried Interfaces In Twisted Oxide Moirés (Cornell, SLAC, Stanford et al.)


A new technical paper titled "Mind the Gap -- Imaging Buried Interfaces in Twisted Oxide Moirés" was published by researchers at Cornell University, SLAC National Accelerator Laboratory, Stanford University, USC, North Carolina State University, University of Chicago, Institute for Basic Science and POSTECH. Abstract "The ability to tune electronic structure in twisted stacks of layered, t... » read more

Chip Industry Technical Paper Roundup: Nov. 4


New technical papers recently added to Semiconductor Engineering’s library: [table id=488 /] Find more semiconductor research papers here. » read more

An Overview Of Recent Progress On The EUV + DSA Strategy (Univ. of Chicago, Berkeley Lab, Argonne)


A new technical paper titled "Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography" was published by researchers at University of Chicago, Lawrence Berkeley National Laboratory and Argonne National Laboratory. Abstract "Extreme ultraviolet (EUV) lithography enables unprecedented resolution in semiconductor patterning but face... » read more

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