Advanced Process Control


David Fried, vice president of computational products at Lam Research, looks at shrinking tolerances at advanced processes, how that affects variation in semiconductor manufacturing, and what can be done to achieve the benefits of scaling without moving to new transistor architectures. » read more

Sidestepping Moore’s Law


Calvin Cheung, vice president of engineering at ASE, sat down with Semiconductor Engineering to talk about advanced packaging, the challenges involved with the technology, and the implications for Moore’s Law. What follows are excerpts of that conversation. SE: What are some of the big issues with IC packaging today? Cheung: Moore’s Law is slowing down, but transistor scaling will co... » read more

Using ML For Post-Silicon Validation


Ira Leventhal, vice president of Advantest’s new concept product initiative, talks about how to use machine learning to ferret out hidden relationships in a complex design and to utilize that data to improve chips. » read more

Week In Review: Design, Low Power


M&A NXP will acquire Marvell's Wi-Fi Connectivity business in an all-cash, asset transaction valued at $1.76 billion. The deal includes the Wi-Fi and Bluetooth technology portfolios and related assets; the business employs approximately 550 people worldwide. The deal is expected to close by calendar Q1 2020. Tools Cadence unveiled a data center-optimized FPGA-based prototyping system, ... » read more

Challenges And Solutions For Silicon Wafer Bevel Defects During 3D NAND Flash Manufacturing


As semiconductor technology scales down in size, process integration complexity and defects are increasing in 3D NAND flash, partially due to larger stack deposits and thickness variability between the wafer center and the wafer edge. Industry participants are working to reduce defect density at the wafer edge to improve overall wafer yield. Attention has focused on common wafer bevel defects s... » read more

New Imaging Tech Finds Buried Defects


By Shinsuke Mizuno and Vadim Kuchik Defects and contamination on the wafer can slow process development times and limit performance and yield. As chips get more complex, more defects can become buried within the increasing number of layers in the design. Finding and analyzing these buried defects is a major challenge for the industry, especially during the early learning cycles of new manufa... » read more

Making AI More Dependable


Ira Leventhal, vice president of Advantest’s new concept product initiative, looks at why AI has taken so long to get going, what role it will play in improving the reliability of all chips, and how to use AI to improve the reliability of AI chips themselves. » read more

Controlling IC Manufacturing Processes For Yield


Equipment and tools vendors are starting to focus on data as a means of improving yield, adding more sensors and analysis capabilities into the manufacturing flow to circumvent problems in real time. How much this will impact the cost of developing complex chips at leading-edge nodes, and in 2.5D and 3D-IC packages, remains to be seen. But the race to both generate data during manufacturing ... » read more

Improving SAQP Patterning Yield Using Virtual Fabrication And Advanced Process Control


Advanced logic scaling has created some difficult technical challenges, including a requirement for highly dense patterning. Imec recently confronted this challenge, by working toward the use of Metal 2 (M2) line patterning with a 16 nm half-pitch for their 7nm node (equivalent to a 5nm foundry node). Self-Aligned Quadruple Patterning (SAQP) was investigated as an alternative path to Extreme Ul... » read more

E-Beam Review And CD Measurement Revolutionizes Display Yield Management


Fundamental changes are occurring in the display industry, driven by demands for higher-resolution screens and other capabilities for both mobile and TV applications. To meet these demands, the display technology roadmap in this article calls for innovations in materials, processes and device technology. Critical requirements include smaller design rules and the adoption of a range of materi... » read more

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