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What’s Changing At BACUS

EUV mask inspection and the impact of machine learning.

August 17th, 2017 - By: Jan Willis

Jim Wiley, president of SPIE BACUS, talks about this year’s merger of the EUV Lithography Symposium and the SPIE Photomask Conference—including what’s new and different, the latest updates on the event location, and topics to look forward to such as EUV mask inspection—as well as his predictions on machine learning.

Jan Willis

(all posts)
Jan Willis is co-founder of the eBeam Initiative. She has held a variety of high-level positions at companies such as Cadence, Synopsys and Hewlett-Packard. She holds a B.S. in Electrical and Computer Engineering from the University of Missouri at Columbia, and an M.B.A. from Stanford University.

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What’s Changing At BACUS

Jan Willis

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Technical Papers

Knowledge Centers Entities, people and technologies explored

Related Articles

Shift Left Is The Tip Of The Iceberg

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Knowledge Centers
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