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Manufacturing Bits: Dec. 6


The National High Magnetic Field Laboratory (MagLab) has broken an unofficial record for the world’s most powerful hybrid magnet. The 33-ton system, called the series connected hybrid (SCH) magnet, has reached its full field strength of 36 tesla. The SCH is more than 40% stronger than the previous world-record hybrid magnet. Tesla, or T, is the measurement of magnetic field strength. A ref... » read more

The Week In Review: Manufacturing


Manufacturing There are more changes at SEMI. SEMI has named David Anderson as president of the SEMI Americas region. Most recently, Anderson was chief executive and chairman of Novati, a specialty manufacturing fab. He replaces Karen Savala, who was president of the SEMI Americas region for six years. In an e-mail, Savala confirmed she left SEMI in October. Meanwhile, in October, SEMI an... » read more

Manufacturing Bits: Nov. 29


Supersonic kinetic spraying Low-cost flexible electronics could enable a new class of products, such as roll-up displays, wearable electronics, flexible solar cells and electronic skin. There is a major barrier to enable these technologies, however. The problem is to make flexible transparent conducting films that are scalable and economical. The University of Illinois at Chicago and Kor... » read more

The Week In Review: Manufacturing


R&D Amid budget cuts in the U.S. government, federal funding for R&D at higher education institutions in the United States declined for a fourth straight year, according to a new report from the National Center for Science and Engineering Statistics (NCSES). Overall, universities reported $68.8 billion in R&D expenditures in 2015, a 2.2% increase from 2014, according to the NCSES, part of t... » read more

Manufacturing Bits: Nov. 23


Materials database The Department of Energy’s Lawrence Berkeley National Laboratory has published a study that quantifies the thermodynamic scale of metastability of some 29,902 materials. To quantify the materials, researchers used Berkeley Lab’s Materials Project, a large and open database of known and predicted materials. The open and Web-based database has calculated the properties ... » read more

Can We Measure Next-Gen FinFETs?


After ramping up their respective 16nm/14nm finFET processes, chipmakers are moving towards 10nm and/or 7nm, with 5nm in R&D. But as they move down the process roadmap, they will face a new set of fab challenges. In addition to lithography and interconnects, there is metrology. Metrology, the science of measurements, is used to characterize tiny films and structures. It helps to boost yi... » read more

Measuring Atoms And Beyond


David Seiler, chief of the Engineering Physics Division within the Physical Measurement Laboratory at the National Institute of Standards and Technology (NIST), sat down with Semiconductor Engineering to discuss the current and future directions of metrology. NIST, a physical science laboratory, is part of the U.S. Department of Commerce. What follows are excerpts of that conversation. SE: W... » read more

The Week In Review: Manufacturing


Chipmakers Next month, GlobalFoundries will host a job fair in Portland, Ore., according to reports. The company hopes to hire former Intel workers. These are workers who lost their jobs as part of Intel's recent layoff. Anokiwave, a developer of chips for the mmWave market, has announced a foundry alliance with GlobalFoundries. GlobalFoundries will make so-called Silicon Core chips on a f... » read more

Inside EUV Resists


Andrew Grenville, chief executive of resist maker Inpria, sat down with Semiconductor Engineering to talk about photoresists for extreme ultraviolet (EUV) lithography. What follows are excerpts of that conversation. SE: Photoresists are a critical part of lithography. Resists are light-sensitive materials. They form patterns on a surface when exposed to light. For EUV, they are critical. Wha... » read more

More EUV Mask Gaps


Extreme ultraviolet (EUV) lithography is at a critical juncture. After several delays and glitches, [gettech id="31045" comment="EUV"] is now targeted for 7nm and/or 5nm. But there are still a number of technologies that must come together before EUV is inserted into mass production. And if the pieces don’t fall into place, EUV could slip again. First, the EUV source must generate more ... » read more

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