Power-Aware Test: Addressing Power Challenges In DFT And Test


Integrated circuit (IC) sizes continue to grow as they meet the compute requirements of cutting-edge applications such as artificial intelligence (AI), autonomous driving, and data centers. As design sizes increase, the total power consumption of the chip also increases. While process node scaling reduces a transistor’s size and its operating-voltage, power scaling has not kept up with the si... » read more

Reducing Rework In CMP: An Enhanced Machine Learning-Based Hybrid Metrology Approach


By Vamsi Velidandla, John Hauck, Zhuo Chen, Joshua Frederick, and Zhihui Jiao The semiconductor industry is constantly marching toward thinner films and complex geometries with smaller dimensions, as well as newer materials. The number of chemical mechanical planarization (CMP) steps has increased and, with it, a greater need for within-wafer uniformity and wafer-to-wafer control of the thin... » read more

Better Optimization For Many-Core AI Chips


The rise of massively parallel computing has led to an explosion of silicon complexity, driven by the need to process data for artificial intelligence (AI) and machine learning (ML) applications. This complexity is seen in designs like the Cerebras Wafer Scale Engine (figure 1), a tiled manycore, multiple wafer die with a transistor count into the trillions and nearly a million compute cores. ... » read more

SLT Enables Test Content To Shift Right


By Dave Armstrong, Davette Berry, and Craig Snyder Increasing device complexity and the continuing drive for higher levels of quality are fostering a reconsideration of test strategies. To be effective, test engineers must choose how to optimally deploy test content, from wafer probing to system-level test (SLT). A March 2019 TestConX presentation1 outlines how test content is typically allo... » read more

Production Testing For Silicon Photonics Wafers


Worldwide data centers and networks for communications currently consume about 8% of the Earth’s total energy produced. To meet the increasing demands for cloud storage, computing, and various emerging applications such as artificial intelligence, genomics revolution, and video transcoding, hyperscale data centers are being built around the world at an accelerated pace, with analysts predicti... » read more

Automotive Innovations In Semiconductors


By Jeff Barnum, Janay Camp, and Cathy Perry Sullivan The semiconductor industry performed better than expected in 2020 despite the impact of COVID-19 on the global economy and is preparing for accelerated growth in 2021 and beyond. The global coronavirus pandemic significantly increased demand for communications electronics and fueled the growth in cloud computing to support remote work and ... » read more

Packetized Scan Test Delivery


The traditional approach to moving scan test data from chip-level pins to core-level scan channels is under pressure due to the dramatic rise in design size, design complexity, and test adaptation. To address these challenges, we now have the option of implementing a packetized data network for scan test that moves the scan data through the SoC much more efficiently than the traditional pin-... » read more

What Does It Take To Build A Successful Multi-Chip Module Factory?


When it comes to multi-chip module (MCM) manufacturing, fan-out wafer-level and fan-out panel-level packaging have received a lot of coverage recently. Every week, it seems like there is an announcement about “Company XYZ” moving their products into the fan-out wafer-level packaging (FOWLP) or fan-out panel-level packaging (FOPLP) space. But these moves come with challenges that didn’t ex... » read more

Driving Toward Predictive Analytics With Dynamic Parametric Test


The foundation of parametric test within semiconductor manufacturing is its usefulness in determining that wafers have been fabricated properly. Foundries use parametric test results to help verify that wafers can be delivered to a customer. For IDMs, the test determines whether the wafers can be sent on for sorting. Usually inserted into the semiconductor manufacturing flow during wafer fabric... » read more

Expanded Material Metrology For Refined Etch Selectivities


Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As EUV lithography (13.5 nm) progresses to larger numerical apertures and new thin resists, new multipatterning sequences must be developed with mutually compatible resists and proximal layers t... » read more

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