Inside EUV Resists


Andrew Grenville, chief executive of resist maker Inpria, sat down with Semiconductor Engineering to talk about photoresists for extreme ultraviolet (EUV) lithography. What follows are excerpts of that conversation. SE: Photoresists are a critical part of lithography. Resists are light-sensitive materials. They form patterns on a surface when exposed to light. For EUV, they are critical. Wha... » read more

The Limits Of The Lifecycle


In the first article in my series on sustainability, I cited one estimate that attributed most of the electricity consumed by an integrated circuit to manufacturing, not use. Other analyses, however, come to exactly the opposite conclusion, with above 90% of lifetime energy consumption accounted for by the use phase. How can that be? The glib answer is that industry efforts to build more eff... » read more

Software Platforms Bridge The Design/Verification Gap For 5G Communications Design


We are entering the third phase of information connectivity, one that will change the use of wireless technology dramatically. The first phase connected homes and businesses through wired telephony and the early internet via dial-up modems. Over the last few decades, the development of communication networks has been superseded by wireless mobile technology connecting people instead of places. ... » read more

More EUV Mask Gaps


Extreme ultraviolet (EUV) lithography is at a critical juncture. After several delays and glitches, [gettech id="31045" comment="EUV"] is now targeted for 7nm and/or 5nm. But there are still a number of technologies that must come together before EUV is inserted into mass production. And if the pieces don’t fall into place, EUV could slip again. First, the EUV source must generate more ... » read more

Fill/Cut Self-Aligned Double-Patterning


By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke Self-aligned double patterning (SADP) is an alternative double-patterning process to the traditional litho-etch-litho-etch (LELE) approach used in most advanced production nodes. The main difference between the two approaches is that in LELE, the layout is divided between two masks, and the second mask is aligned with resp... » read more

Human Factors In Automation Software


The semiconductor industry offers some of the most advanced manufacturing environments featuring sophisticated automation and cutting-edge process controls. A typical day in a fab revolves around the production of billions of highly complex, extremely small structures where even the tiniest variations can impact device performance. Even though these production processes are highly automated, te... » read more

Making 2.5D, Fan-Outs Cheaper


Now that it has been shown to work, the race is on to make advanced [getkc id="27" kc_name="packaging"] more affordable. While device scaling could continue for another decade or more, the number of companies that can afford to develop SoCs at the leading edge will continue to decline. The question now being addressed is what can supplant it, supplement it, or redefine it. At the center o... » read more

A Product Development Flow For 5G/LTE Envelope Tracking Power Amplifiers


Next-generation communication systems will rely on system architectures that will challenge component level design. This NI AWR software white paper examines the use of envelope tracking (ET), digital pre-distortion, and impedance matching via load pull to improve the efficiency and linearity performance of RF PAs targeting 4G and 5G applications. To read more, click here. » read more

Mastering The Magic Of Multi-Patterning


Multi-patterning technology was introduced at the 20 nm node to overcome lithographic limitations in current IC manufacturing processes. While processes like double and triple patterning may sometimes seem like magic, successfully implementing multi-patterning compliance in the IC design and verification flow requires a thorough understanding of multi-patterning techniques and their impact on y... » read more

Why EUV Is So Difficult


For years, extreme ultraviolet (EUV) lithography has been a promising technology that was supposed to help enable advanced chip scaling. But after years of R&D, EUV is still not in production despite major backing from the industry, vast resources and billions of dollars in funding. More recently, though, [gettech id="31045" comment="EUV"] lithography appears to be inching closer to pos... » read more

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