Manufacturing Bits: July 12


Detecting zeptojoules Aalto University has broken the world’s record for microwave detection. Specifically, researchers detected zeptojoule microwave pulses using a superconducting microwave detector, based on proximity-induced Josephson junctions. This broke the record by fourteenfold, according to researchers. Microwaves are a form of electromagnetic radiation. They have frequencies... » read more

FD-SOI Strains For The Future


One of the challenges facing supporters of FD-SOI is the need to provide a pathway to improved performance. While FD-SOI wafers offer some significant advantages over bulk silicon wafers, performance enhancements like strain and alternative channel materials are more difficult to implement in the thin SOI environment. On the other hand, once a fab is willing to incorporate layer transfer techni... » read more

E-beam Vs. Optical Inspection


The wafer inspection business is heating up as chipmakers encounter new and tiny killer defects in advanced devices. Last month ASML Holding entered into an agreement to acquire Hermes Microvision (HMI), the world’s largest e-beam inspection vendor, for $3.1 billion. The proposed move propelled ASML into the e-beam wafer inspection market. In addition, [getentity id="22817" e_name="Appl... » read more

The Week In Review: Manufacturing


Fab materials/tools The Reference Project, a pan-European research program created to develop radio-frequency silicon-on-insulator (RF-SOI) technology, was recently launched at the Bernin, France-based facilities of Soitec. Soitec is the project leader in the group, which has an eligible budget of 33 million euros. The project will focus on developing technologies for 4G+ communications usi... » read more

Manufacturing Bits: July 5


World’s largest telescope China stunned the industry last month, when the nation rolled out the world’s fastest supercomputer. The system, dubbed the Sunway TaihuLight, is based on processors made in China, not Intel or other U.S. chipmakers. Now, China has nearly finished the construction of the world’s largest radio telescope. The system, dubbed the Five-hundred-meter Aperture Sphe... » read more

The Week In Review: Manufacturing


Fab tools Applied Materials has officially rolled out the Producer Selectra system, a selective etch tool. The system falls under the loosely defined category called atomic layer etch (ALE). Applied’s technology addresses a number of challenges. Today’s advanced chips have complex structures. They may also have deep and narrow trenches. One of the challenges is the inability of wet ... » read more

Atomic Layer Etch Heats Up


The atomic layer etch (ALE) market is starting to heat up as chipmakers push to 10nm and beyond. ALE is a promising next-generation etch technology that has been in R&D for the last several years, but until now there has been little or no need to use it. Unlike conventional etch tools, which remove materials on a continuous basis, ALE promises to selectively and precisely remove targete... » read more

Data Analytics To Drive IC Shift


The adoption of predictive analytics has the potential to drive the next round of IC industry innovation and growth. Much of the necessary data handling technology is now available from other sectors. However, to fully capitalize on the possibilities, the IC manufacturing world faces particular challenges in figuring out how to get a high yield of actionable information from its streams of vari... » read more

Manufacturing Bits: June 28


Redefining the kilogram The National Institute of Standards and Technology (NIST) has developed a new scale that could one day enable a new and improved definition of the kilogram. The scale is called the NIST-4 watt balance. It has conducted its first measurement of a physical quantity called Planck’s constant to within 34 parts per billion. The scale is not intended to alter the va... » read more

Interconnect Challenges Rising


Chipmakers are ramping up their 14nm finFET processes, with 10nm and 7nm slated to ship possibly later this year or next. At 10nm and beyond, IC vendors are determined to scale the two main parts of the [getkc id="185" kc_name="finFET"] structure—the transistor and interconnects. Generally, transistor scaling will remain challenging at advanced nodes. And on top of that, the interconnects ... » read more

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