Colorless vs. Colored Double-Patterning Design Flows


Colored vs. Colorless double patterning design flows—do you know which one is best for your design? What options does your foundry allow? Do you debug one differently from the other? In this short video, I’ll demonstrate the differences between colored and colorless DP design flows, and explain the options and potential pitfalls of each approach. With a better understanding of how to design... » read more

Pattern Dependence Process Modeling


First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” prior to actual fabrication. In some instances, a deeper level of complexity needs to be added to the process model to capture the effects of variation in the process. Specific examples inclu... » read more

3D Printing: What Does It Mean For The Semiconductor Industry?


Semico Research was pleased to host the 3D printing TechXPOT at SEMICON West 2016, in conjunction with SEMI. We also hosted the inaugural 3D printing session at SEMICON West 2014. What is striking is how much the 3D printing industry has changed in those two years. In 2014, 3D printing was at the height of media attention; the major questions were when each home would have its own 3D printer. I... » read more

200mm Equipment Shortfall


A surge in demand for consumer electronics, communications ICs, sensors and other products has created a shortage in 200mm fab capacity that shows no signs of abating. None of these chips need to be manufactured using the most advanced processes, and there have been enough tweaks to processes at established nodes to eke even more out of existing processes. But that has left chipmakers strugg... » read more

To 7nm And Beyond


Gary Patton, chief technology officer at [getentity id="22819" comment="GlobalFoundries"], and Thomas Caulfield, senior vice president and general manager of Fab 8, sat down with Semiconductor Engineering to discuss future directions in technology, including the next rev of FD-SOI, the future of Moore’s Law, and how some very public challenges will likely unfold. SE: What do you see as the... » read more

Foundry Capacity Investment Led By Taiwan And China


The era of every company building a captive fab for next-generation products is ancient history, as foundries throughout the world provide leading-edge technology and flexible capacity in a timely and cost-effective manner. In today’s mobile-driven ecosystem, faster product development cycles and time-to-market have become the norm for the industry. Now, this trend is even spreading to the co... » read more

Building Faster Chips


By Ed Sperling and Jeff Dorsch An explosion in IoT sensor data, the onset of deep learning and AI, and the commercial rollout of augmented and virtual reality are driving a renewed interest in performance as the key metric for semiconductor design. Throughout the past decade in which mobility/smartphone dominated chip design, power replaced performance as the top driver. Processors ha... » read more

Stacking Logic On Logic


Advanced packaging can be an alphabet soup of possible approaches, from heterogenous integration of multiple die types into a single package, to three-dimensional stacking of multiple dies on top of each other. Three-dimensional chip stacking is most commonly seen in memory devices. Applied to logic, though, there are at least two different ways for integration to proceed. Completely process... » read more

RF Front End Testing With NI PXI


What composes an RF front end in today’s radio devices? If you were to take apart your mobile phone, you would see an assortment of chips with different functions that make wireless communication possible. This white paper focuses on the duplexer, power amplifiers (PAs), and RF transceiver. To read more, click here. » read more

Virtual Fabrication For MEMS Process Development


MEMS fabrication and design are closely coupled, such that design changes could significantly alter the process flow and vice versa. For instance, setting device parameters such as drive capacitance, deflection distance, or proof mass size directly affects the choice of film thickness, etch rate, sidewall profile and so forth. Typically, this requires multiple iterations of the MEMS design/proc... » read more

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