More Efficient On-Chip Laser Frequency Comb (Harvard)


A new technical paper titled "High-efficiency and broadband on-chip electro-optic frequency comb generators" was published by researchers at Harvard, Stanford, Caltech, and Hyperlight. The research claims the electro-optic frequency device is 100% more efficient and has 2X the bandwidth of previous technology.    According to Harvard's news release, "the latest research applies the two con... » read more

Scaling Down To 2nm: Using Microwaves For Efficient & Stable Doping


A new technical paper titled "Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit" was just published by researchers at National Taiwan University, Cornell University, TSMC, University of Valladolid, DSG Technologies, National Central University and National Yang Ming Chiao Tung University. A modified microwave was used... » read more

Modeling Effects Of Fluctuation Sources On Electrical Characteristics Of GAA Si NS MOSFETs Using ANN-Based ML


Researchers from National Yang Ming Chiao Tung University (Taiwan) published a technical paper titled "A Machine Learning Approach to Modeling Intrinsic Parameter Fluctuation of Gate-All-Around Si Nanosheet MOSFETs." "This study has comprehensively analyzed the potential of the ANN-based ML strategy in modeling the effect of fluctuation sources on electrical characteristics of GAA Si NS MOSF... » read more

Robust Latch Hardened Against QNUs for Safety-Critical Applications in 22nm CMOS Technology


A technical paper titled "Cost-Optimized and Robust Latch Hardened against Quadruple Node Upsets for Nanoscale CMOS" was just published by researchers at Anhui University, Hefei University of Technology, Anhui Polytechnic University, Kyushu Institute of Technology, and the University of Montpellier/CNRS. Abstract: "With the aggressive reduction of CMOS transistor feature sizes, the soft ... » read more

Structural Phase Transition In Minute Detail On A Very Fast Timescale–A Path To Improved Computer Memories (Argonne National Lab)


A new technical paper titled "X-ray nanodiffraction imaging reveals distinct nanoscopic dynamics of an ultrafast phase transition" was published by researchers at Argonne National Lab, UCSD, and the University of Wisconsin–Madison. According to Argonne National Lab's news release," researchers have for the first time been able to look at a structural phase transition in minute detail on a ... » read more

Control of the Schottky barrier height in monolayer WS2 FETs using molecular doping (NIST)


A new research paper titled "Control of the Schottky barrier height in monolayer WS2 FETs using molecular doping" was published by researchers at NIST, Theiss Research, Naval Research Laboratory, and Nova Research. Abstract: "The development of processes to controllably dope two-dimensional semiconductors is critical to achieving next generation electronic and optoelectronic devices. Unde... » read more

Mass Production of Soft And Stretchable Electronics


This new technical paper titled "Scalable Manufacturing of Liquid Metal Circuits" was published by researchers at Carnegie Mellon University. The work presents "a novel technique for scalable and reproducible manufacturing of LM-based SSEs [soft and stretchable electronics] with integrated solid-state microelectronic components. The manufacturing technique is based on a selective metal-alloy... » read more

Mass Producing Qubits (Imec and KU Leuven)


This new technical paper titled "Path toward manufacturable superconducting qubits with relaxation times exceeding 0.1 ms" was published by researchers at Imec and KU Leuven. Abstract "As the superconducting qubit platform matures towards ever-larger scales in the race towards a practical quantum computer, limitations due to qubit inhomogeneity through lack of process control become app... » read more

Particle Removal From EUV Photomasks


This technical paper titled "AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction" was just published by researchers at ASML, RWTH Aachen University, and AMO GmbH. The research reports a vaccuum AFM-based approach for particle removal from EUV photomasks. Find the technical paper here. Published August 2022. Ku, B., van de Wetering, F., Bolten, J., Stel, B., van de K... » read more

ML Architecture for Solving the Inverse Problem for Matter Wave Lithography: LACENET


This recent technical paper titled "Realistic mask generation for matter-wave lithography via machine learning" was published by researchers at University of Bergen (Norway). Abstract: "Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metasta... » read more

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