category: Manufacturing

category: IoT, Security & Automotive

Thinning of GaN-on-GaN HEMTs With A Laser Slicing Technique
By Technical Paper Link - 09 May, 2022 - Comments: 0

New technical paper "Laser slice thinning of GaN-on-GaN high electron mobility transistors" from researchers at Nagoya University, Hamamatsu Photonics, and National Institute for Materials Science, Tsukuba. Abstract "As a newly developed technique to slice GaN substrates, which are currently very expensive, with less loss, we previously reported a laser slicing technique in this journal. In... » read more

ASD process that was performed in situ on the etch chamber
By Technical Paper Link - 06 May, 2022 - Comments: 0

New research paper entitled "Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement" from TEL Technology Center, Americas and IBM Research. Abstract: "Extreme ultraviolet (EUV) lithography has overcome significant challenges to become an essential enabler to the logic scaling roadmap. However, it remains limited by stocha... » read more

Die-level Thinning and Integrating Route For Singulated MPW Chips Using Both Silicon Sensors and CMOS Devices
By Technical Paper Link - 30 Apr, 2022 - Comments: 0

Abstract "Die-level thinning, handling, and integration of singulated dies from multi-project wafers (MPW) are often used in research, early-stage development, and prototyping of flexible devices. There is a high demand for thin silicon devices for several applications, such as flexible electronics. To address this demand, we study a novel post-processing method on two silicon devices, an el... » read more

Pyrolyzed Cellulose Nanofiber Paper (CNP) Semiconductor with a 3D Network Structure
By Technical Paper Link - 26 Apr, 2022 - Comments: 0

Abstract Semiconducting nanomaterials with 3D network structures exhibit various fascinating properties such as electrical conduction, high permeability, and large surface areas, which are beneficial for adsorption, separation, and sensing applications. However, research on these materials is substantially restricted by the limited trans-scalability of their structural design and tunability of... » read more

Artificial intelligence deep learning for 3D IC reliability prediction
By Technical Paper Link - 25 Apr, 2022 - Comments: 0

New research from National Yang Ming Chiao Tung University, National Center for High-Performance Computing (Taiwan), Tunghai University, MA-Tek Inc, and UCLA. Abstract "Three-dimensional integrated circuit (3D IC) technologies have been receiving much attention recently due to the near-ending of Moore’s law of minimization in 2D IC. However, the reliability of 3D IC, which is greatly infl... » read more

Selective etching of silicon nitride over silicon oxide using ClF3 /H2 remote plasma
By Technical Paper Link - 18 Apr, 2022 - Comments: 0

Researchers from Sungkyunkwan University, MIT and others present an option for selective etching. Abstract "Precise and selective removal of silicon nitride (SiNx) over silicon oxide (SiOy) in a oxide/nitride stack is crucial for a current three dimensional NOT-AND type flash memory fabrication process. In this study, fast and selective isotropic etching of SiNx over SiOy has been investiga... » read more

Source performance metrics for EUV mask inspection
By Technical Paper Link - 18 Apr, 2022 - Comments: 0

Abstract "Rules are derived to obtain specifications on radiance, power, lifetime, and cleanliness of the source for an actinic patterned mask inspection system. We focus on the physical processes and technological aspects governing the requirements of radiation sources for reticle inspection. We discuss differences and similarities to scanner with respect to magnification, system etendue, a... » read more

Gallium Oxide Power Electronic Roadmap
By Technical Paper Link - 18 Apr, 2022 - Comments: 0

New research paper addressing challenges in using gallium oxide. ABSTRACT "Gallium Oxide has undergone rapid technological maturation over the last decade, pushing it to the forefront of ultra-wide band gap semiconductor technologies. Maximizing the potential for a new semiconductor system requires a concerted effort by the community to address technical barriers which limit performance. Du... » read more

Novel Methods To Enhance Data Quality in FMEA Documents In Semiconductor Manufacturing
By Technical Paper Link - 12 Apr, 2022 - Comments: 0

New research paper from Graz University of Technology & others. Abstract "Digitalization of causal domain knowledge is crucial. Especially since the inclusion of causal domain knowledge in the data analysis processes helps to avoid biased results. To extract such knowledge, the Failure Mode Effect Analysis (FMEA) documents represent a valuable data source. Originally, FMEA documents were de... » read more

Direct Chemisorption-Assisted Nanotransfer Printing with Wafer-Scale Uniformity and Controllability
By Technical Paper Link - 06 Apr, 2022 - Comments: 0

New academic paper from Nanyang Technological University, Korea Institute of Machinery & Materials, and Southwest Jiaotong University. Abstract "Nanotransfer printing techniques have attracted significant attention due to their outstanding simplicity, cost-effectiveness, and high throughput. However, conventional methods via a chemical medium hamper the efficient fabrication with large-area... » read more

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