Particle Removal From EUV Photomasks


This technical paper titled “AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction” was just published by researchers at ASML, RWTH Aachen University, and AMO GmbH.

The research reports a vaccuum AFM-based approach for particle removal from EUV photomasks.

Find the technical paper here. Published August 2022.

Ku, B., van de Wetering, F., Bolten, J., Stel, B., van de Kerkhof, M. A., Lemme, M. C., AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction. Adv. Mater. Technol. 2022, 2200411. https://doi.org/10.1002/admt.202200411.

Related Material
AFM Knowledge Center
Nanosheet FETs Drive Changes In Metrology And Inspection
Detecting defects inside deep or hidden structures requires a multitool approach.
Photomask Shortages Grow At Mature Nodes
Aging equipment and rising demand are pushing up prices and slowing production.
Finding, Predicting EUV Stochastic Defects
Unusual effects at 5/3nm, including fewer defects with double patterning.

Leave a Reply

(Note: This name will be displayed publicly)