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Particle Removal From EUV Photomasks

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This technical paper titled “AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction” was just published by researchers at ASML, RWTH Aachen University, and AMO GmbH.

The research reports a vaccuum AFM-based approach for particle removal from EUV photomasks.

Find the technical paper here. Published August 2022.

Ku, B., van de Wetering, F., Bolten, J., Stel, B., van de Kerkhof, M. A., Lemme, M. C., AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction. Adv. Mater. Technol. 2022, 2200411. https://doi.org/10.1002/admt.202200411.

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