category: Videos

category: IoT, Security & Automotive

Tech Talk: 10nm Patterning
By Brian Bailey - 20 Aug, 2015 - Comments: 0

David Abercrombie, advanced physical verification methodology program manager at Mentor Graphics, talks about triple and quadruple patterning after 20/16/14nm and what design teams need to understand to get this right. [youtube vid=7bjutPWakpw] » read more

Tech Talk: Wafer Plane Analysis
By Ed Sperling - 23 Jul, 2015 - Comments: 0

Leo Pang, executive vice president at D2S, talks about the problems of patterning at 40nm and below and how to deal with them more effectively using existing equipment. [youtube vid=FbRyhw2q3fE] » read more

Tech Talk: 22nm FD-SOI
By Ed Sperling - 13 Jul, 2015 - Comments: 0

Subramani Kengeri, vice president of global design solutions at GlobalFoundries, discusses the evolution of 22nm FD-SOI and its advantages, including single patterning in the middle end of line, 0.4 volt operating voltage, and how it compares to finFETs in terms of performance. [youtube vid=5fa1AcIGcUw] » read more

Tech Talk: 14nm
By Ed Sperling - 21 May, 2015 - Comments: 0

Tamer Ragheb, digital design methodology technical lead at GlobalFoundries about what's changed with 14nm finFETs, including coloring with double patterning, new corners, Miller Effects, timing issues and variability. [youtube vid=Yk6jSKCtsjU] » read more

Tech Talk: Moore’s Law
By Ed Sperling - 16 Mar, 2015 - Comments: 0

Aki Fujimara, CEO of D2S, talks with Semiconductor Engineering about the the technical challenges of scaling device and functionality, and the economics on cost per gate. [youtube vid=hBXtSCRbR64] » read more

Tech Talk: Photomask Challenges
By Mark LaPedus - 22 Jan, 2015 - Comments: 0

GlobalFoundries' Bob Pack talks with Semiconductor Engineering about new problems experienced by photomask shops and how does lithography affects it all. [youtube vid=8hJwVhaZhFc] » read more

Tech Talk: Inverse Lithography
By Ed Sperling - 11 Dec, 2014 - Comments: 0

D2S’ Leo Pang talks with Semiconductor Engineering about lithography, inverse lithography, photomasks, where the problems are, and what needs to be done to move forward. [youtube vid=mn8JWaP8Z68] » read more

Tech Talk: Concurrent Test
By Ed Sperling - 18 Jun, 2014 - Comments: 2

Dave Armstrong, director of business development at Advantest, discusses the usefulness of concurrent test and describes how to maximize the value of this approach. [youtube vid=UFPxTlB2LWQ] » read more

Tech Talk: Multipatterning, Take Two
By Brian Bailey - 31 Mar, 2014 - Comments: 0

Mentor Graphics' David Abercrombie continues with his whiteboard talk about coloring with advanced lithography, including what goes wrong and how to fix it. [youtube vid=HCBtvHCcbf4] » read more

Next-Generation Lithography
By Ed Sperling - 04 Mar, 2014 - Comments: 0

Aki Fujimura, CEO of D2S, sat down with Semiconductor Engineering to talk about the challenges of moving to the next process nodes and how that will affect everything from lithography to the write time, size and cost of photomasks. [youtube vid=L96vi-BjhDU] » read more

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