Tamer Ragheb, digital design methodology technical lead at GlobalFoundries about what’s changed with 14nm finFETs, including coloring with double patterning, new corners, Miller Effects, timing issues and variability.
Understanding how chiplets interact under different workloads is critical to ensuring signal integrity and optimal performance in heterogeneous designs.
Alongside high-NA EUV will be better-performing photoresists, reduced roughness using passivation and etch, and lateral etching to reduce tip-to-tip dimensions.
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