tag: 28nm

The Week In Review: Design
By Ed Sperling - 27 Jun, 2014 - Comments: 0

Tools eSilicon uncorked a GDSII online quote system for TSMC, which allows chipmakers to pick a variety of information ranging from process technology to package to yield and tapeout and production forecast and get a quote within minutes. This is a new twist in the value chain provider market. Synopsys added program to speed up FPGA-based prototype creation, which includes approved third-pa... » read more

Semiconductor R&D Crisis Ahead?
By Ed Sperling - 26 Jun, 2014 - Comments: 0

Listen to engineering management at chipmakers these days and a consistent theme emerges: They’re all petrified about where to place their next technology bets. Do they move to 14/16nm finFETs with plans to shrink to 10nm, 7nm and maybe even 5nm? Do they invest in 2.5D and 3D stacked die? Or do they eke more from existing process nodes using new process technologies, more compact designs and ... » read more

The Week In Review: Design
By Ed Sperling - 06 Jun, 2014 - Comments: 0

Tools Mentor Graphics rolled out embedded Linux software for AMD’s x86 G-series SoCs, code-named Steppe Eagle and its Crowned Eagle CPUs. Ansys-Apache and TowerJazz have created a power noise and reliability signoff design kit, including reference flow guidelines, test case examples and flow setup guidance. Synopsys updated its verification portfolio with static and formal tools for CD... » read more

Drowning In Choices
By Ed Sperling - 15 May, 2014 - Comments: 0

There are at least half a dozen possible options for 28nm process technologies. There will be even more for the finFET generation. And that’s just the beginning of how complicated things will become over the next few years. There are multiple ways to test, seemingly infinite numbers of IP offerings—even from the same IP providers—and even more packaging options to put them together. Th... » read more

Shootout At 28nm
By Ed Sperling - 15 May, 2014 - Comments: 0

By Ed Sperling & Mark LaPedus Samsung, Soitec and STMicroelectronics are joining forces on 28nm FD-SOI, creating a showdown with TSMC and others over the best single-patterned processes and materials and raising questions about how quickly companies need to move to the finFET technology generation. The multi-source manufacturing collaboration agreement for fully depleted silicon-on-insulato... » read more

What’s Wrong With Power Signoff
By Ed Sperling - 12 May, 2014 - Comments: 0

Power signoff used to be a checklist item before a design went to tapeout. But as power has become a critical factor in designs, particularly at advanced nodes, signing off on power now needs to be done at multiple points throughout the design flow. That alone adds even greater complexity to already complex design processes because it requires fixed reference points and scenarios for taking mea... » read more

Stopping Mask Hotspots Before They Escape The Mask Shop
By eBeam Initiative - 28 Apr, 2014 - Comments: 3

By Aki Fujimura The same types of physics-based issues that have haunted lithography for decades have started to impact mask writing as well. The increasingly small and complex mask shapes specified by optical proximity correction (OPC) that are now required for faithful wafer lithography at 28nm-and-below nodes have given rise to an increase in mask hotspots. Mask hotspots occur when the shap... » read more

Power Moves Up To First Place
By Ed Sperling - 10 Apr, 2014 - Comments: 2

Virtually every presentation delivered about semiconductor design or manufacturing these days—and every end product specification that uses advanced technology—incorporates some reference to power and/or energy. It has emerged as the most persistent, most problematic, and certainly the most talked about issue from conception to marketplace adoption. And the conversation only grows louder... » read more

How Much Will That Chip Cost?
By Ed Sperling - 27 Mar, 2014 - Comments: 1

From the most advanced process nodes to the trailing edge of design there is talk about the skyrocketing cost of developing increasingly complex SoCs. At 16/14nm it’s a combination of multi-patterning, multiple power domains and factoring in physical and proximity effects. At older nodes, it’s the shift to more sophisticated versions of the processes and new tools to work within those proce... » read more

Litho Is Out Of Sync
By Ed Sperling - 20 Mar, 2014 - Comments: 0

EUV’s repeated missed deadlines, and the slow-motion response by the rest of the industry to fill the void with alternatives, is having ripple effects in every facet and corner of the semiconductor industry. It’s making design harder and more expensive, introducing potential errors into the DFM flow, and greatly increasing the amount of time it takes to process wafers. It’s also adding a ... » read more

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