tag: IBM

Shades Of Gray
By Ed Sperling - 06 Dec, 2012 - Comments: 0

As more things talk to other things, and as we begin accumulating more devices that can communicate with other devices, one key question will begin surfacing in the power/performance arena—are we really better off than we were before? This is a deceptively simple, open-ended question with some very complex answers. But it’s also essential that we provide enough answers to satisfy critics... » read more

Don’t miss Fully-Depleted Tech Symposium during IEDM (SF)
By Various Writers - 04 Dec, 2012 - Comments: 0

Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~  ~ If you want to cut through the noise surrounding the choices for 28nm and beyond, an excellent place to start is the SOI Consortium’s Fully Depleted Technology Symposium. As a member of the design and manufacturing communities, this is your chance to see and hear what industry leaders are actually doing. Planar? F... » read more

How To Make A Brain-On-A-Chip
By Mark LaPedus - 15 Nov, 2012 - Comments: 0

By Mark LaPedus In October, Draper Laboratory and the University of South Florida (USF) disclosed an ambitious plan to develop a brain-on-a-chip. The idea is to devise a “micro-environment’’ that mimics the human brain. Researchers hope to study neurodegenerative conditions such as Alzheimer’s disease, strokes and concussions. The eventual goal is to study the effects of drugs and v... » read more

Facing Up To RC Delay
By Ed Sperling - 15 Nov, 2012 - Comments: 0

y Ed Sperling Resistance and capacitance delays have always been someone else’s problem to solve at some fuzzy process node in the future, and for the most part manufacturers and equipment makers have done a wizard-like job of making this problem go away. They can’t make it disappear anymore, though, and beginning at 14nm and beyond RC delay is becoming more than just an annoyance. The ... » read more

New Incentives For Lowering Power
By Ed Sperling - 08 Nov, 2012 - Comments: 0

By Ed Sperling Despite all the focus by design teams on lowering power over the past few years, in many applications power is still the last consideration for many companies in the power-performance-area equation. That’s beginning to change, however, even for applications that in the past have not been particularly power-sensitive. There are several reasons for this shift. No. 1 on the li... » read more

Cellular Stranglehold?
By Ann Mutschler - 08 Nov, 2012 - Comments: 0

Do you ever feel like you are completely at the mercy of your cellular service provider? Yeah, me too. Not only did I have to change providers when I relocated, I had to buy a new phone of course. Since my old phone and my new phone were both iPhones, I thought for sure I could use the same car charger….but no dice. This fact has bothered me for quite some time because it made no sense to ... » read more

Experts At The Table: Issues In Lithography
By Ed Sperling - 29 Oct, 2012 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. (Part one can be found here.) SMD: Let’s re-vi... » read more

Quantum Shifts
By Ed Sperling - 25 Oct, 2012 - Comments: 0

By Ed Sperling Intel, STMicroelectronics and some of the leading memory providers already are working on 10nm process technology, and advanced researchers in universities and industry-leading companies are looking at 7nm, 5nm and even beyond. Those who have glimpsed this technological future have similar observations. There is no single technology problem that has to be solved at these node... » read more

Moore’s Law Revisited
By Ed Sperling - 25 Oct, 2012 - Comments: 0

It’s no surprise that Moore’s Law can continue for many more generations. Intel’s road map already extends down to 5nm, most likely with carbon nanotube FETs, tunnel FETs, graphene TSVs and maybe even fully depleted SOI to replace bulk CMOS. The rest of the industry has been hanging back a node or two, gliding on the coattails of what Intel and companies like IBM, Samsung and STMicroel... » read more

Mask Repair Enters The Spotlight
By Ed Sperling - 18 Oct, 2012 - Comments: 0

By Mark LaPedus For years, the biggest challenges in photomask manufacturing have revolved around the slow write times for electron-beam tools and soaring mask inspection costs. Now, photomask repair, a sometimes forgotten technology in the mask shop, is in the spotlight and turning into the clash of the titans. Mask repair involves the process of finding defects on a photomask and repairin... » read more

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