tag: D2S

The Great Quantum Computing Race
By Mark LaPedus - 26 Jul, 2021 - Comments: 0

Quantum computing is heating up, as a growing number of entities race to benchmark, stabilize, and ultimately commercialize this technology. As of July 2021, a group from China appears to have taken the lead in terms of raw performance, but Google, IBM, Intel and other quantum computer developers aren’t far behind. All of that could change overnight, though. At this point, it's too early t... » read more

What About Mask Rule Checking For Curvilinear Photomasks?
By Jan Willis - 22 Jul, 2021 - Comments: 0

The entire photomask design chain needs to be considered in the adoption of curvilinear photomasks. A broad look at the ecosystem impact was addressed in a previous video but a more in-depth look at the design chain of photomasks raises the next question – will MRC be harder and take more time? Aki Fujimura of D2S opens the nine-minute panel video with industry luminaries by providing a conce... » read more

Survey: 2020 eBeam Initiative Annual Survey Results
By eBeam Initiative - 21 Jul, 2021 - Comments: 0

Aki Fujimura, the CEO of D2S, Inc. presented "The eBeam Initiative's Annual Survey Results at Photomask" at Photomask Japan 2021 in April 2021. Survey says that COVID has a net neutral business impact on total mask revenues. By 2021, 24% positive vs 20% negative COVID-related business predictions. 74% agree actinic inspection for EUV HVM by 2023, and more results. Click here to read more. » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 02 Jul, 2021 - Comments: 0

Chipmakers and OEMs More delays and product woes at Intel. “INTC disclosed that it is delaying the launch of its next-generation Xeon server processor Sapphire Rapids (10nm) from the end of this year to 1Q22 due to additional validation needed for the chip,” said John Vinh, an analyst at KeyBanc, in a research note. “Production is expected to begin in 1Q22, with the ramp expected to begi... » read more

Finding, Predicting EUV Stochastic Defects
By Mark LaPedus - 17 Jun, 2021 - Comments: 0

Several vendors are rolling out next-generation inspection systems and software that locates problematic defects in chips caused by processes in extreme ultraviolet (EUV) lithography. Each defect detection technology involves various tradeoffs. But it’s imperative to use one or more of them in the fab. Ultimately, these so-called stochastic-induced defects caused by EUV can impact the perf... » read more

Developing A New Curvilinear Data Format
By Jan Willis - 17 Jun, 2021 - Comments: 0

The data size generated by curvilinear masks could impact turnaround time (TAT) for photomask production and hence the adoption of curvilinear masks. In a previous blog on curvilinear masks, our panel of luminaries discuss some possible solutions in a video discussion. In this seventh video, the panel looks at some ideas to define a new curvilinear data format to reduce file sizes. Aki Fujimura... » read more

How Will The Adoption Of Curvilinear Masks Affect Turnaround Time?
By Jan Willis - 01 Jun, 2021 - Comments: 0

Turnaround time (TAT) for photomask makers has historically increased at smaller and smaller process nodes, as reported in the eBeam Initiative Mask Makers surveys, so it’s important to look at the impact of curvilinear masks on TAT. In this sixth installment of our blog series on curvilinear masks, Aki Fujimura of D2S explores this question with luminaries in the industry during a video pane... » read more

Blog Review: May 26
By Jesse Allen - 26 May, 2021 - Comments: 0

Cadence's Paul McLellan checks out challenges in designing processors for AI applications, the explosion in the number of weights used to language processing, and the current state of training and inference hardware. Synopsys' Mike Gianfagna explores how hyper-convergent design will push device capabilities through integration of multiple technologies, multiple protocols, and multiple archit... » read more

Demand, Lead Times Soar For 300mm Equipment
By Mark LaPedus - 20 May, 2021 - Comments: 0

A surge in demand for various chips is causing select shortages and extended lead times for many types of 300mm semiconductor equipment, photomask tools, wafers, and other products. For the last several years, 200mm equipment has been in short supply in the market, but issues are now cropping up throughout the 300mm supply chain, as well. Traditionally, lead times have been three to six mont... » read more

Is The Photomask Ecosystem Ready For Curvilinear ILT?
By Jan Willis - 18 May, 2021 - Comments: 0

The time it takes to write a photomask with curvilinear shapes was a major historical barrier to adoption inverse lithography technology (ILT), as discussed in the second installment of our blog series on curvilinear mask shapes. After years of development, multi-beam mask writers came into production and one of their features is the ability to write curvilinear masks without a write time penal... » read more

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