Litho Is Out Of Sync


EUV’s repeated missed deadlines, and the slow-motion response by the rest of the industry to fill the void with alternatives, is having ripple effects in every facet and corner of the semiconductor industry. It’s making design harder and more expensive, introducing potential errors into the DFM flow, and greatly increasing the amount of time it takes to process wafers. It’s also adding a ... » read more

Enabling Test Portability With Graphs


Is it time to move up again? When it comes to test portability between simulation, emulation, prototypes and silicon, as well as an easier way to create a test structure, the answer appears to be a resounding ‘Yes.’ Looking at these activities from a higher level of abstraction and using a graph-based approach should allow automation where there has been none previously, and could allow val... » read more

Experts At The Table: Yield And Reliability Issues With Integrating IP


Semiconductor Engineering sat down to discuss the impact of integrating IP in complex SoCs with Juan Rey, senior director of engineering at Mentor Graphics; Kevin Yee, product marketing director for Cadence’s SoC Realization Group; and Mike Gianfagna, vice president of marketing at eSilicon. What follows are excerpts of that conversation. SE: Do we need to move to subsystems or more restri... » read more

Routing Closure Challenges At 28nm And Below


As I described in my last article, the gap between router tech files and signoff rule decks at 28 nm and below is generating some serious impacts on tapeout schedules. The mismatch between the router’s simplified tech file and the complex rules that represent the intricate manufacturing requirements at these leading-edge nodes means designs that come from the router “DRC/DFM-clean” will, ... » read more

From DFM To IFM


For the past decade the bridge between design and manufacturing was called, appropriately enough, design for manufacturing. DFM tools, which by nature cross boundaries of what previously were discrete segments in the semiconductor flow, are now critical for complex designs. They allow design teams to check early in the design process whether chips will yield sufficiently and to incorporate rule... » read more

Paving The Way To 16/14nm


The move to the next stop on the Moore’s Law road map isn’t getting any less expensive or easier, but it is becoming more predictable. Tools and programs are being expanded to address physical effects such as electrostatic discharge (ESD), electromigration and thermal effects from increased current density. Any or all of these three checklist items can affect the reliability of a chip. A... » read more

Reducing The Tapeout Crunch With Signoff Confidence


Crunch time—that last six to eight weeks before tapeout. There’s always too much to do, and too little time. No one wants problems at this stage, because problems mean changes, and changes mean delays. At leading-edge nodes, however, we’re running into some new problems that need new solutions. We all know design rule numbers and complexity are going through the roof as we try to use 1... » read more

Improving Design Reliability By Avoiding Electrical Overstress


Electrical overstress (EOS) is one of the leading causes of IC failures across all semiconductor manufacturers, and is responsible for the vast majority of device failures and product returns. The use of multiple voltages increases the risk of EOS, so IC designers need to increase their diligence to ensure that thin-oxide digital transistors do not have direct or indirect paths to high-voltage ... » read more

The Week In Review: Sept. 6


By Ed Sperling ARM acquired Cadence’s high-resolution display processor cores, which it helped to co-develop. Coupled with ARM’s own graphics, the move sets up ARM to sell complete subsystems. Cadence also won a deal with SMIC, which is using Cadence’s low-power flow and signoff technology for its 40nm process. Mentor Graphics won a deal with Advanced Wireless Semiconductor Co., whic... » read more

The Week In Review: Aug. 16


By Ed Sperling Manufacturing Equipment giant Applied Materials added three extra letters company president Gary Dickerson’s title—CEO. Mike Splinter, who has served as the company’s CEO since 2003, will become executive chairman of the board of directors. Dickerson was the CEO of Varian, which Applied Materials acquired in 2011. Synopsys introduced a Dolby decoder for its ARC process... » read more

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