Challenges Mount For Patterning And Masks


Semiconductor Engineering sat down to discuss lithography and photomask trends with Uday Mitra, vice president and chief technology officer for the Etch Business Unit at [getentity id="22817" e_name="Applied Materials"]; Pawitter Mangat, senior manager and deputy director for EUV lithography at [getentity id="22819" comment="GlobalFoundries"]; Aki Fujimura, chief executive at [getentity id="228... » read more

The Week In Review: Manufacturing


Here’s a sad commentary on the state of Japan’s electronics industry: Some Japanese electronics giants are converting unused factories and fabs into agricultural growing facilities, according to The Wall Street Journal. Last month, for example, Fujitsu began selling lettuce from the Aizu-Wakamatsu plant. It's officially over. IBM's talks to sell its chip unit to GlobalFoundries have offi... » read more

The Week In Review: Manufacturing


GlobalFoundries has emerged as the leading candidate to buy IBM's semiconductor unit, according to Reuters, which cited the Wall Street Journal as it source. IBM, which recently put its semiconductor unit on the block, has held discussions with GlobalFoundries, Intel and Taiwan Semiconductor Manufacturing Co. Ltd. GlobalFoundries did not respond to the reports by press time. GlobalFoundries ... » read more

One-on-One: Naoya Hayashi


Semiconductor Engineering sat down to discuss the current and future challenges in the photomask industry with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP). SE: What are the big challenges for the photomask industry today? Hayashi: There are several challenges. Most of the challenges involve mask complexity. It is also quite difficult to handle the mask data, because it is ... » read more

The Week In Review: Manufacturing


SPIE Advanced Lithography is a patterning show. At the event, however, Applied Materials revealed more details regarding its selective materials removal opportunity, according to Weston Twigg, an analyst with Pacific Crest Securities, in a research note. Applied Materials presented a paper entitled, “Where Is Plasma Etching Going from Here?” “The presenter outlined concepts for thin layer... » read more

Multi-Beam Begins To Shine


After years of R&D and promises, multi-beam electron-beam technology is delayed and late to the market. The technology requires more funding and work than previously thought. And generally, the skepticism is running high for the technology. Finally, however, there is a ray of hope, and some momentum, in multi-beam—at least on the photomask front. Seeking to accelerate its multi-beam te... » read more

Newer posts →