Experts At The Table: Multipatterning


By Ed Sperling Semiconductor Manufacturing & Design sat down with Michael White, physical verification product line manager at Mentor Graphics; Luigi Capodieci, R&D fellow at GlobalFoundries; Lars Liebmann, IBM distinguished engineer; Rob Aitken, ARM fellow; Jean-Pierre Geronimi, CAD director at STMicroelectronics; and Kuang-Kuo Lin, director of foundry design enablement at Samsung Ele... » read more

Experts At The Table: Does 20nm Break System-Level Design?


By Ann Steffora Mutschler System-Level Design sat down to discuss design at 20nm with Drew Wingard, chief technology officer at Sonics; Kelvin Low, deputy director of product marketing at GlobalFoundries, Frank Schirrmeister, group director of product marketing for system development in the system and software realization group at Cadence; and Mike Gianfagna, vice president of marketing at Atr... » read more

Future Foundry Issues


Semiconductor Manufacturing & Design talks with Luigi Capodieci, fellow at GlobalFoundries, about EUV, the challenges at 20nm and beyond, and the future of the foundry model. [youtube vid=YXov4y0kpfU] » read more

28, 20nm Nodes Demand Advanced Power Management


By Ann Steffora Mutschler With the complexity of getting 28 and 20nm designs to reach desired yields with the desired power and performance on the shoulders of design teams, advanced power management techniques are a must. Sub-clock power gating, clock power gate structures, adaptive body bias and other techniques are making it possible. Sub-Clock Power Gating Far from a new techniqu... » read more

Experts At The Table: Does 20nm Break System-Level Design?


By Ann Steffora Mutschler System-Level Design sat down to discuss design at 20nm with Drew Wingard, chief technology officer at Sonics; Kelvin Low, deputy director of product marketing at GlobalFoundries, Frank Schirrmeister, group director of product marketing for system development in the system and software realization group at Cadence; and Mike Gianfagna, vice president of marketing at Atr... » read more

Experts At The Table: IP Subsystems


By Ed Sperling Semiconductor Manufacturing & Design sat down to discuss the transition to IP subsystems with Kevin Meyer, vice president of design enablement strategy and alliances at GlobalFoundries; Steve Roddy, vice president of marketing at Tensilica; Mike Gianfagna, vice president of marketing at Atrenta; and Adam Kablanian, CEO of Memoir Systems. What follows are excerpts of that con... » read more

Experts At The Table: Multipatterning


By Ed Sperling Semiconductor Manufacturing & Design sat down with Michael White, physical verification product line manager at Mentor Graphics; Luigi Capodieci, R&D fellow at GlobalFoundries; Lars Liebmann, IBM distinguished engineer; Rob Aitken, ARM fellow; Jean-Pierre Geronimi, CAD director at STMicroelectronics; and Kuang-Kuo Lin, director of foundry design enablement at Samsung Ele... » read more

CNSE Readying NFX Fab for G450C, EUV Efforts


By David Lammers Two key areas of the semiconductor industry’s future—the 450mm wafer transition and EUV lithography—are the focus of the new NFX (NanoFab Xtension) building now under construction at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. [caption id="attachment_6322" align="alignright" width="120" caption="Alain Kaloyeros"][/caption] T... » read more

Foundries Going Greener


The ongoing push towards green and energy-efficient systems is prompting the silicon foundries to jump on the bandwagon and devise their next-generation processes based on ultra-high voltage technology. For some time, several foundries have offered 1- and 0.5-micron, ultra-high voltage processes with ratings up to 800 volts. But seeking to get a jump for the next wave of designs, the special... » read more

Fabless-Foundry Model Under Stress


By Mark LaPedus The semiconductor roadmap was once a smooth and straightforward path, but chipmakers face a bumpy and challenging ride as they migrate to the 20nm node and beyond. Among the challenges seen on the horizon are the advent of 3D stacking, 450mm fabs, new transistor architectures, multi-patterning, and the questionable availability of extreme ultraviolet (EUV) lithography. ... » read more

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