tag: IBM

Optical Lithography, Take Two
By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter stages of 10nm or by 7nm, but vendors are not counting on EUV in the near term and are preparing their back-up plans. Barring a breakthrough with EUV or other technology, IC ... » read more

Multicore Madness
By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus Smartphones and tablets are migrating towards new and faster application processors, basebands, graphics chips and memories. In the cell-phone chipset area alone, there are a multitude of options and design considerations. Some devices combine the application processor and modem on the same chip. Some are separate devices. In addition, the architectures range from single- to... » read more

Accelerating Moore’s Law
By Ed Sperling - 21 Feb, 2013 - Comments: 0

By Ed Sperling Ever since the inception of Moore’s Law, process nodes have moved forward at a rate of once every 18 to 24 months. Companies have been talking about slowing down the rate of progression as things get harder, but at least for the next couple of process nodes something very strange will occur—Moore’s Law will accelerate. The root cause is growing competition for a shrinki... » read more

The Best Foundry Strategy
By Joanne Itow - 21 Feb, 2013 - Comments: 0

By Joanne Itow Today, foundries supply more than 20% of the silicon used to produce all the semiconductor products sold. The foundry impact has grown from only 10% in 1997 to 24% today. The significance of foundries is even more evident when focused on logic wafers alone. Figure 1. Foundry Wafers as a Percent of Total, IC’s, and IC’s Minus Memory [caption id="attachment_7339" align="... » read more

Making The Right Choices
By Ed Sperling - 21 Feb, 2013 - Comments: 0

FD-SOI at 28nm, or finFETs at 20/14nm? To companies looking at the cost equation, the total market opportunity for SoCs and the NRE required to get there, this is still a manageable formula. It requires lots of number crunching and some unknowns, but by the time you get done with the math it still falls within an acceptable margin of error and the choices are relatively simple. For foundries... » read more

SOI Highlights at Common Platform Tech Forum
By Various Writers - 19 Feb, 2013 - Comments: 0

Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~  ~ The 2013 Common Platform Technology Forum showcased “the latest technological advances being delivered to the world’s leading electronics companies,” so of course SOI-based topics were well-represented. Happily, those of us who weren’t able to get over to Silicon Valley were able to attend “virtually” via a ... » read more

New Issues In Signoff
By Ed Sperling - 14 Feb, 2013 - Comments: 0

By Ed Sperling Signoff has always been a challenge at every stage of an SoC design flow. No matter how good a design looks, or how well a prototype works, there are still problems that can crop up at any stage of the design flow all the way into manufacturing that can leave engineering teams shaking their heads. Even at mainstream process nodes, respins are common. At advanced nodes—part... » read more

Uncommon Goals
By Atrenta - 14 Feb, 2013 - Comments: 0

I had the opportunity to attend the Common Platform event recently. This is a technology and business showcase sponsored by Global Foundries, IBM and Samsung with major support from ARM, Cadence, Synopsys and Mentor. Wow, that’s some serious sponsorship. The event was well run and provided a good balance of technology details and business outlook. The wine at the evening reception was decent ... » read more

Tech Talk: Getting To The Next Node
By Ed Sperling - 14 Feb, 2013 - Comments: 0

IBM's Gary Patton talks with Low-Power/High-Performance Engineering about finFETs, EUV, and the challenges of staying on the Moore's Law road map. [youtube vid=jtz9XSXyBp0] » read more

Math Questions
By Ed Sperling - 08 Feb, 2013 - Comments: 0

The race is on. GlobalFoundries, TSMC, Samsung, IBM and Intel are all neck deep in research, test chips, variability, lithography and three-dimensional transistor designs. For the first time, though, the goal very publicly has shifted from performance and area to energy efficiency. Being able to double battery life with existing performance over the next couple nodes could mean smart phones ... » read more

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