Simultaneous Bi-Directional Signaling: A Breakthrough Alternative For Multi-Die Assemblies


In designing multi-die systems-in-package, with or without chiplets, it is easy to think of the interconnect between dies as simply analogous to the interconnect between functional blocks on a single die. But this analogy can lead architects and designers into a blind alley from which it becomes impossible to meet system performance and power requirements. The reason lies in fundamental differe... » read more

Characterizing Three Supercomputers: Multi-GPU Interconnect Performance


A new technical paper titled "Exploring GPU-to-GPU Communication: Insights into Supercomputer Interconnects" was published by researchers at Sapienza University of Rome, University of Trento, Vrije Universiteit Amsterdam, ETH Zurich, CINECA, University of Antwerp, IBM Research Europe, HPE Cray, and NVIDIA. Abstract "Multi-GPU nodes are increasingly common in the rapidly evolving landscape... » read more

Here At Last! Automated Verification Of Heterogeneous 2D/3D Package Connectivity


By Michael Walsh and Jin Hou with Todd Burkholder The heterogeneous integration of multiple ICs in a single package along with high-performance, high-bandwidth memory is critical for many high-performance computing applications. After everything has been heterogeneously integrated and packaged, such designs feature complex connectivity with many hundreds of thousands of connections, making i... » read more

Optimizing Interconnect Topologies For Automotive ADAS Applications


Designing automotive Advanced Driver Assistance Systems (ADAS) applications can be incredibly complex. State-of-the-art ADAS and autonomous driving systems use ‘sensor fusion’ to combine inputs from multiple sources, typically cameras and optionally radar and lidar units to go beyond passive and active safety to automate driving. Vision processing systems combine specialized AI accelerators... » read more

Essential Insights for Design PCIe 6.0 Interconnects


PCI Express (PCIe) is a serial communication protocol that has progressed through generations to enhance data rates and functionality. The latest version, PCIe 6.0, doubles the data rate to 64 GT/s, enabling up to 256 GB/s of bandwidth in an x16 configuration. The technology incorporates PAM4 signaling and forward error correction to maintain high speeds with improved signal integrity and relia... » read more

Survey of CXL Implementations and Standards (Intel, Microsoft)


A new technical paper titled "An Introduction to the Compute Express Link (CXL) Interconnect" was published by researchers at Intel Corporation, Microsoft, and University of Washington. Abstract "The Compute Express Link (CXL) is an open industry-standard interconnect between processors and devices such as accelerators, memory buffers, smart network interfaces, persistent memory, and solid-... » read more

SiC Power Electronics Packaging: Floating Die Structure and Liquid Metal Fluidic Connection (Cambridge U. )


A new technical paper titled "Liquid Metal Fluidic Connection and Floating Die Structure for Ultralow Thermomechanical Stress of SiC Power Electronics Packaging" was published by researchers at Cambridge University. Abstract "Coefficients of thermal expansion (CTE) of various materials in packaging structure layers vary largely, causing significant thermomechanical stress in power electroni... » read more

Cadence Janus NoC System IP


The Cadence Janus Network on Chip (NoC) is a new highly configurable soft IP designed to speed up the system-on-chip (SoC) and full system design cycle by reducing some of the problems associated with large SoCs. With many more processing nodes, as well as memory and I/O nodes designed into the SoC, the interconnect becomes a major design hurdle. Wiring congestion and wire loads introduce ch... » read more

Ruthenium Interconnects On Tap


Chipmakers' focus on new interconnect technology is ramping up as copper's effectiveness continues to diminish, setting the stage for a significant shift that could improve performance and reduce heat at future nodes and in advanced packages. The introduction of copper interconnects in 1997 upended the then-standard tungsten via/aluminum line metallization scheme. Dual damascene integration ... » read more

Interconnects: Criteria For Alternative Metal Benchmarking And Selection (Imec, KU Leuven)


A technical paper titled “Selecting Alternative Metals for Advanced Interconnects” was published by researchers at imec and KU Leuven. Abstract “Today, interconnect resistance and reliability are key limiters for the performance of advanced CMOS circuits. As transistor scaling is slowing, interconnect scaling has become the main driver for circuit miniaturization, and interconnect lim... » read more

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