tag: Onto Innovation

The Great Quantum Computing Race
By Mark LaPedus - 26 Jul, 2021 - Comments: 0

Quantum computing is heating up, as a growing number of entities race to benchmark, stabilize, and ultimately commercialize this technology. As of July 2021, a group from China appears to have taken the lead in terms of raw performance, but Google, IBM, Intel and other quantum computer developers aren’t far behind. All of that could change overnight, though. At this point, it's too early t... » read more

Geo-Spatial Outlier Detection
By Anne Meixner - 19 Jul, 2021 - Comments: 0

Comparing die test results with other die on a wafer helps identify outliers, but combining that data with the exact location of an outlier offers a much deeper understanding of what can go wrong and why. The main idea in outlier detection is to find something in or on a die that is different from all the other dies on a wafer. Doing this in the context of a die’s neighbor has become easie... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 16 Jul, 2021 - Comments: 0

Chipmakers The chip industry is buzzing over a Wall Street Journal report that Intel is in talks to buy GlobalFoundries (GF) for $30 billion. In March, Intel re-entered the foundry business, positioning itself against Samsung and TSMC at the leading edge, and against a multitude of foundries working at older nodes. Intel planned to jumpstart its foundry business within its own fabs. But it... » read more

5G Chips Add Test Challenges
By Bryon Moyer - 06 Jul, 2021 - Comments: 1

The advent of chips supporting millimeter-wave (mmWave) 5G signals is creating a new set of design and testing challenges. Effects that could be ignored at lower frequencies are now important. Performing high-volume test of RF chips will require much more from automated test equipment (ATE) than is required for chips operating below 6 GHz. “MmWave design is a pretty old thing,” said Y... » read more

Cleaning Up During IC Test
By Anne Meixner - 06 Jul, 2021 - Comments: 2

Test is a dirty business. It can contaminate a unit or wafer, or the test hardware, which in turn can cause problems in the field. While this has not gone unnoticed, particularly as costs rise due to increasing pin and ball density, and as more chips are bundled together in a package, the cost of dirt continues to be a focus. Cleaning recipes for test interface boards are changing, and analy... » read more

What Does It Take To Build A Successful Multi-Chip Module Factory?
By Mike McIntyre - 06 Jul, 2021 - Comments: 0

When it comes to multi-chip module (MCM) manufacturing, fan-out wafer-level and fan-out panel-level packaging have received a lot of coverage recently. Every week, it seems like there is an announcement about “Company XYZ” moving their products into the fan-out wafer-level packaging (FOWLP) or fan-out panel-level packaging (FOPLP) space. But these moves come with challenges that didn’t ex... » read more

IC Data Hot Potato: Who Owns And Manages It?
By SE Staff - 06 Jul, 2021 - Comments: 1

Modern inspection, metrology, and test equipment produces a flood of data during the manufacturing and testing of semiconductors. Now the question is what to do with all of that data. Image resolutions in inspection and metrology have been improving for some time to deal with increased density and smaller features, creating a downstream effect that has largely gone unmanaged. Higher resoluti... » read more

There’s More To Machine Learning Than CNNs
By Bryon Moyer - 09 Jun, 2021 - Comments: 1

Neural networks – and convolutional neural networks (CNNs) in particular – have received an abundance of attention over the last few years, but they're not the only useful machine-learning structures. There are numerous other ways for machines to learn how to solve problems, and there is room for alternative machine-learning structures. “Neural networks can do all this really comple... » read more

Reliability Costs Becoming Harder To Track
By SE Staff - 08 Jun, 2021 - Comments: 0

Ensuring reliability in chips is becoming more complex and significantly more expensive, shifting left into the design cycle and right into the field. But those costs also are becoming more difficult to define and track, varying greatly from one design to the next based upon process node, package technology, market segment, and which fab or OSAT is used. As the number of options increases fo... » read more

Expanded Material Metrology For Refined Etch Selectivities
By Anoop Somanchi - 08 Jun, 2021 - Comments: 0

Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As EUV lithography (13.5 nm) progresses to larger numerical apertures and new thin resists, new multipatterning sequences must be developed with mutually compatible resists and proximal layers t... » read more

← Older posts Newer posts →

  • Sponsors

About

Navigation

Connect With Us

Copyright ©2013-2025 SMG   |  Terms of Service  |  Privacy Policy