CD Step Application in Edge Air Layer Structure Measurement for Bulk Acoustic Resonator


A vital component of modern communication systems, bulk acoustic wave resonators (BAW) function as filters, oscillators, and sensors. In a BAW device, the acoustic waves are confined within a specific region to achieve efficient resonance. The air ring structure, including the edge air layer structure, prevents acoustic energy from leaking. However, measuring the critical dimensions (CD) of edg... » read more

Tool Matching Getting Tougher Across Test & Metrology


Key Takeaways Engineers leverage both device-specific and tool-level data to identify a process "sweet spot." Tight, frequent tool-to-tool matching enables greater yield and fab flexibility. Machine learning helps capture the nuances of a tool's signature. Many people outside of the semiconductor industry wonder how humans can fabricate transistors with tens of nanometer sca... » read more

Digital Twins: The Cloud’s The Limit


Key Takeaways Digital twins are gaining traction as a way of testing different options at every step of the design-through-manufacturing flow. AI can be used to glue together disparate data types in multi-physics simulations. The promise of digital twins is huge, but multiple challenges need to be solved before it can live up to its potential. Digital twin technology is draw... » read more

Tool And Methodology Changes Coming In Fab And Package Automation


Experts at the table: Semiconductor Engineering sat down to discuss what's changing in semiconductor fabs and packaging houses with Michael Lowman, senior product marketing manager for Data Analytics at Cohu; Aftkhar Aslam, CEO at yieldWerx, Woo Young Han, product marketing director at Onto Innovation; and Lihong Cao, senior director of engineering and technical marketing for ASE. What foll... » read more

Back-End Automation Tackles Growing Complexity


Experts at the table: Semiconductor Engineering sat down to discuss back-end automation challenges in advanced packaging with Michael Lowman, senior product marketing manager for Data Analytics at Cohu; Aftkhar Aslam, CEO at yieldWerx, Woo Young Han, product marketing director at Onto Innovation; and Lihong Cao, senior director of engineering and technical marketing for ASE. What follows are ex... » read more

When Cleaning Chips Isn’t Clean Enough


Key Takeaways Contamination is becoming much more difficult to identify at the most advanced nodes, forcing fabs to rethink how control is achieved. Issues may show up as electrical or statistical anomalies, not particles, and not at time zero. Reliable classification is needed to identify critical contamination and reduce time and effort spent on nuisance failures. For much... » read more

Catching Critical Defects In TSVs And Stacked Chips


Key Takeaways Variation is becoming a bigger problem in multi-die assemblies with TSVs and hybrid bonding. Multi-modal approaches are required to test these devices. AI plays a role in improving defect capture rate and distinguishing between yield-killing and false positives. New methods for interconnecting devices using through-silicon vias (TSVs) and hybrid bonding in stac... » read more

Resistance In Advanced Packages Is Now A System-Level Problem


Key Takeaways Kelvin measurement, which has been in use for decades, is no longer sufficient for addressing resistance in complex chips. The problem is that resistance is no longer concentrated in transistors, and where it does show up isn't always consistent or obvious. Traditional pass/fail approaches need to be replaced by more granular and flexible analytics and methodologies. ... » read more

Chiplets Add More Inspection And Test Steps


Key Takeaways Ensuring the reliability of multi-die assemblies requires a variety of approaches to detect subsurface defects. Bonds and interconnects are especially problematic and require more inspection insertions. Ensuring reliability requires connecting fragmented data that is often siloed. The shift to multi-die assemblies is forcing changes in how chips are tested and ... » read more

Picosecond Ultrasonics: An Advanced Technology Utilized for Process Control of SiCr Thin Film Resistors


The bipolar-CMOS-DMOS (BCD) process is an advanced semiconductor technology integrating bipolar, CMOS, and DMOS devices onto a single chip, providing a compact, high-performance platform for the integration of analog, digital, and power circuitry. Thin-film resistors are employed to ensure precise resistance values and minimal temperature coefficients (TCR), thereby delivering enhanced accuracy... » read more

← Older posts Newer posts →