3D Effects At 20nm And Beyond

By Ann Mutschler - 19 Mar, 2015 - Comments: 0

At the 20nm process node and below, attenuated phase shift masks (PSM) are used in the photolithography process, which results in approximately 70nm of topography. This now must be accounted for using 3D mask approximation. Aki Fujimura, CEO of [getentity id="22864" comment="D2S"], explained that in terms of [getkc id="80" comment="lithography"], where simulation-based technologies are used,... » read more

Tech Talk: Moore’s Law

By Ed Sperling - 16 Mar, 2015 - Comments: 0

Aki Fujimara, CEO of D2S, talks with Semiconductor Engineering about the the technical challenges of scaling device and functionality, and the economics on cost per gate. [youtube vid=hBXtSCRbR64] » read more

5 Disruptive Mask Technologies

By Mark LaPedus - 19 Feb, 2015 - Comments: 0

Photomask complexity and costs are increasing at each node, thereby creating a number of challenges on several fronts. On one front, for example, traditional single-beam e-beam tools are struggling to keep up with mask complexity. As a result, the write times and costs continue to rise. Mask complexity also impacts the other parts of the tool flow, such as inspection, metrology and repair. I... » read more

Demonstrating The Benefits Of Source-Mask Optimization And Enabling Technologies Through Experiment And Simulations

By Mentor, a Siemens Business - 19 Feb, 2015 - Comments: 0

In recent years the potential of Source-Mask Optimization (SMO) as an enabling technology for 22nm-and-beyond lithography has been explored and documented in the literature. It has been shown that intensive optimization of the fundamental degrees of freedom in the optical system allows for the creation of non-intuitive solutions in both the mask and the source, which leads to improved lithograp... » read more

Tech Talk: Photomask Challenges

By Mark LaPedus - 22 Jan, 2015 - Comments: 0

GlobalFoundries' Bob Pack talks with Semiconductor Engineering about new problems experienced by photomask shops and how does lithography affects it all. [youtube vid=8hJwVhaZhFc] » read more

Design Rules Explode At New Nodes

By Ed Sperling - 17 Nov, 2014 - Comments: 0

Semiconductor Engineering sat down changing design rules with Sergey Shumarayev, senior director of custom IP design at Altera; Luigi Capodieci, R&D fellow at [getentity id="22819" comment="GlobalFoundries"]; Michael White, director of product marketing for Calibre Physical Verification at [getentity id="22017" e_name="Mentor Graphics"], and Coby Zelnik, CEO of [getentity id="22478" e_name=... » read more

We Have Reached The Tipping Point For Simulation-Based Mask Data Preparation

By Aki Fujimura - 13 Nov, 2014 - Comments: 0

Since the beginning of the semiconductor industry, mask-data preparation (MDP) and mask verification (MV) have been shape-based: each shape has been treated as an entity unto itself, and if each isolated shape was correct, the mask was correct. This context independence is a critical assumption for conventional fracturing. However, as line/space measurements (L:S) fall below 50nm, shape-ba... » read more

Executive Insight: Elmar Platzgummer

By Mark LaPedus - 13 Nov, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss photomask and lithography trends with Elmar Platzgummer, chief executive of IMS Nanofabrication, an Austrian-based supplier of multi-beam e-beam tools for mask writing applications. SE: IMS has shipped the world’s first multi-beam e-beam system. Initially targeted for photomask writing, the tools are currently being tested in the field. How lon... » read more

The Impact Of 14nm Photomask Uncertainties On Computational Lithography Solutions

By Mentor, a Siemens Business - 16 Oct, 2014 - Comments: 0

Computational lithography solutions rely upon accurate process models to faithfully represent the imaging system output for a defined set of process and design inputs. These models, in turn, rely upon the accurate representation of multiple parameters associated with the scanner and the photomask. While certain system input variables, such as scanner numerical aperture, can be empirically tuned... » read more

Executive Insight: Aki Fujimura

By Mark LaPedus - 16 Oct, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss photomask technology and lithography trends with Aki Fujimura, chairman and chief executive of D2S. SE: What are the big challenges that keep you awake at night? Fujimura: Mask technology, and the investments in the mask industry, are increasingly important. But so far, the investment dollars that the community is willing to spend on it isn’... » read more

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Knowledge Centers
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tag: photomasks