Battling Over Shrinking Physical Margin In Chips

By Ed Sperling - 31 Jul, 2023 - Comments: 0

Smaller process nodes, coupled with a continual quest to add more features into designs, are forcing chipmakers and systems companies to choose which design and manufacturing groups have access to a shrinking pool of technology margin. In the past margin largely was split between the foundries, which imposed highly restrictive design rules (RDRs) to compensate for uncertainties in new proces... » read more

The Bumpy Road To 10nm FinFETs

By Mark LaPedus - 21 May, 2015 - Comments: 0

Foundry vendors are currently ramping up their 16nm/14nm [getkc id="185" kc_name="finFET"] processes in the market. Vendors are battling each other for business in the arena, although the migration from planar to finFETs is expected to be a slow and expensive process. Still, despite the challenges at 16nm/14nm, vendors are gearing up for the next battle in the foundry business—the 10nm nod... » read more

One-On-One: Dark Silicon

By Katherine Derbyshire - 09 Apr, 2015 - Comments: 0

Professor Michael Taylor’s research group at UC San Diego is studying ways to exploit dark silicon to optimize circuit designs for energy efficiency. He spoke with Semiconductor Engineering about the post-Dennard scaling regime, energy efficiency from integrated circuits all the way up to data centers, and how the manufacturing side can help. What follows are excerpts of that conversation. (F... » read more

DFM And Multipatterning

By Ed Sperling - 03 Jul, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss DFM at advanced nodes with Kuang-Kuo Lin, director of foundry design enablement at Samsung Electronics; Jongwook Kye, lithography modeling and architecture fellow at GlobalFoundries; David Abercrombie, advanced physical verification methodology program manager at Mentor Graphics; Ya-Chieh Lai, engineering director for DFM/CLS silicon signoff and ver... » read more

Good Pattern Flow Ahead For 14, 10nm

By Ann Mutschler - 21 Feb, 2013 - Comments: 0

By Ann Steffora Mutschler Given complexity, yield, power and other challenges with leading edge manufacturing, semiconductor foundries increasingly have been forced to require more and more restrictive design rules with each new process node. “They keep adding more design rules and more operations to a particular check to eliminate corner cases where in manufacturing they saw some variant... » read more

Increasing Levels Of Risk

By Ed Sperling - 13 Dec, 2012 - Comments: 0

Semiconductor Manufacturing & Design sits down with Mentor Graphics' Jean-Marie Brunet to talk about double patterning, finFETs, design rules at advanced nodes and why design for manufacturing (DFM) has suddenly become so popular. [youtube vid=3GHvikyjZow] » read more

Restrictive Design Rules, Take Two

By Ed Sperling - 27 Aug, 2009 - Comments: 0

By Ed Sperling For the past couple of years, restrictive design rules have been looming over advanced process nodes as the best way to get a chip out the door with minimal re-spins, on schedule and for the least amount of money. Even with immersion technology, 193nm wavelengths mean the laser beam is entirely too large to create the masks used to create complex systems on chip at 32nm and bel... » read more

Software Becomes The Main Differentiating Factor

By Ed Sperling - 10 Jun, 2009 - Comments: 0

By Ed Sperling Software has always been critical in determining what makes one chip different from another, but for the next couple of process nodes it will take on new significance. Rather than just defining function, it also will be one of the key determinants in performance and function. Behind this change is a bottleneck in lithography, which generally is not something most design eng... » read more

Knowledge Centers
Entities, people and technologies explored

Shift Left Is The Tip Of The Iceberg

A transformative change is underway for semiconductor design and EDA. New languages, models, and abstractions will need to be created.

by Brian Bailey

Partitioning In The Chiplet Era

Understanding how chiplets interact under different workloads is critical to ensuring signal integrity and optimal performance in heterogeneous designs.

by Ann Mutschler

NAND Flash Targets 1,000 Layers

New techniques go beyond improved deposition and etching, but challenges stack up, too.

by Bryon Moyer

3.5D: The Great Compromise

Pros and cons of a middle-ground chiplet assembly that combines 2.5D and 3D-IC.

by Ed Sperling

AI’s Role In Chip Design Widens, Drawing In New Startups

Focus is on letting engineers do much more with the same or fewer resources — and less drudgery.

by Karen Heyman

What Comes After HBM For Chiplets

The standard for high-bandwidth memory limits design freedom at many levels, but that is required for interoperability. What freedoms can be taken from other functions to make chiplets possible?

by Brian Bailey

Memory Fundamentals For Engineers

eBook: Nearly everything you need to know about memory, including detailed explanations of the different types of memory; how and where these are used today; what's changing, which memories are successful and which ones might be in the future; and the limitations of each memory type.

by The SE Staff

New AI Processors Architectures Balance Speed With Efficiency

Hot Chips 24: Large language models ratchet up pressure for sustainable computing and heterogeneous integration; data management becomes key differentiator.