Yield Tracking In RDL


Yield is a much bigger issue when it comes to panel-level packages, which may contain up to 24 RDL layers. Just finding the defects is a massive challenge, let alone understanding how they will impact the entire device. Many of these advanced packages are being used in data centers for generative AI, and killer defects caused by bridges and opens can cause serious problems. What happens, for in... » read more

ML-Assisted IC Test Binning With Real-Time Prediction At The Edge


IC Test is a critical part of semiconductor manufacturing and proper die binning and material disposition has an important impact on the overall yield and on the process monitoring and failure mode diagnostics. Edge analytics are becoming an increasingly important aspect of die disposition. By intercepting parts in real-time at the wafer test step, we can save downstream processing needs. In th... » read more

Fabs Begin Ramping Up Machine Learning


Fabs are beginning to deploy machine learning models to drill deep into complex processes, leveraging both vast compute power and significant advances in ML. All of this is necessary as dimensions shrink and complexity increases with new materials and structures, processes, and packaging options, and as demand for reliability increases. Building robust models requires training the algorithms... » read more

Improving Semiconductor Yield Using Large Area Analysis


Design rule checking (DRC) is a technique used during chip design to ensure that a device can successfully be manufactured at high yield. Design rules are established based on the limits and variability of equipment and process technologies in use. DRC checking ensures that a design meets manufacturing requirements and will not result in a chip failure or DRC “violation.” Common DRC rules i... » read more

Total Overlay With Multiple RDLs


As Advanced IC Substrates (AICS) add more RDL layers, requiring additional via connections between the RDL layers, the potential for cumulative overlay shift increases. This overlay shift can lead to longer RDL traces, which increases interconnect resistance, resulting in lower yield. Keith Best, director of product marketing, for lithography at Onto Innovation, talks about total overlay — th... » read more

Rebalancing Test And Yield In IC Manufacturing


Balancing yield and test is essential to semiconductor manufacturing, but it's becoming harder to determine how much weight to give one versus the other as chips become more specialized for different applications. Yield focuses on maximizing the number of functional chips from a production batch, while test aims to ensure that each chip meets rigorous quality and performance standards. And w... » read more

Installing Yield Software Early In A Ramp Up


In 1999, the White Oak Semiconductor Fab in Richmond, VA, was awarded the prestigious “Top Fab of the Year” (yes, that actually existed – proof attached!) by the leading semiconductor magazine of the time. Back then, I was a young engineer on the ramp up team and I recall that the reason we were chosen for the award was the incredibly short time in which we were able to ramp up production... » read more

Customizing IC Test To Improve Yield And Reliability


Testing the performance and power of semiconductors as they come off the production line is beginning to shift left in the fab, reversing a long-standing trend of assessing chips just prior to shipping. While this may sound straightforward, it's a difficult challenge which, if successful, will have broad implications for the entire design-through-manufacturing flow. Manufacturers typically g... » read more

Test Strategies In The Era Of Heterogeneous Integration


Moore’s Law, the observation that the number of transistors on an integrated circuit doubles approximately every two years, is critical to advances in computing technology. For decades, fabs have managed to achieve exponential growth in digital capability and transistor density by making transistors smaller and smaller, but we’ve hit the physical limits of these processes. Today, new proces... » read more

Addressing Copper Clad Laminate Processing Distortion Using Overlay Corrections


All great voyages must come to an end. Such is the case with our series on the challenges facing the manufacturing of advanced IC substrates (AICS), the glue holding the heterogeneous integration ship together. In our first blog, we examined how cumulative overlay drift from individual redistribution layers could significantly increase overall trace length, resulting in higher interconnect res... » read more

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