Mark LaPedus

  (all posts)
Mark LaPedus is Executive Editor for manufacturing at Semiconductor Engineering.

Author's Latest Posts

The Week In Review: Oct. 18
By Mark LaPedus - 18 Oct, 2013 - Comments: 0

By Mark LaPedus & Ed Sperling The problems continue with extreme ultraviolet (EUV) lithography. ASML promised to deliver an 80 Watt power source by year’s end. Now, the company said it only will have a 70 Watt source by mid-2014. “We are focusing on reaching the 70 Watts by the middle of next year,” said Peter Wennink, ASML’s CEO, in a conference call to discuss the company’s res... » read more

Applied-TEL Watch
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

By Mark LaPedus So far this year, the biggest story in the fab tool industry is fairly obvious—Applied Materials recently signed a definitive agreement to acquire rival Tokyo Electron Ltd. (TEL) for about $9.3 billion. The blockbuster announcement will likely be the top story of 2013. Of course, the integration of Applied and TEL will be a challenge. In any case, the Applied-TEL deal is i... » read more

Multi-Beam Begins To Shine
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

After years of R&D and promises, multi-beam electron-beam technology is delayed and late to the market. The technology requires more funding and work than previously thought. And generally, the skepticism is running high for the technology. Finally, however, there is a ray of hope, and some momentum, in multi-beam—at least on the photomask front. Seeking to accelerate its multi-beam te... » read more

Debate Heats Up Over Bigger Glass
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

For more than two decades, photomask makers have been talking about moving to a new and larger mask size, sometimes called “bigger glass” by the industry. Generally, the discussions about “bigger glass” have been all talk and no action. But now, some chipmakers are turning up the volume in the discussions and are pushing for a larger mask size. A larger mask size would require the ph... » read more

Executive Briefing: Getting Direct On Litho
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

Semiconductor Engineering sat down and talked with David Lam, principal of the David Lam Group, an investment and advisory firm. Lam is also the chairman of Multibeam, a multi-beam equipment startup for direct-write lithography and other applications. He founded Lam Research in 1980 and left as an employee in 1985. He served on Lam Research’s board for five years after that. SE: Multibeam ... » read more

Challenges Mount For EUV Masks
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

ASML Holding’s first production-worthy scanners for extreme ultraviolet (EUV) lithography are expected to ship this year, but there are still a number of challenges to bring the technology into high-volume manufacturing. As before, the three main challenges for EUV are the power sources, resists and photomasks. To date, the resists are making progress, while the EUV power sources remain a ... » read more

Manufacturing Bits: Oct. 15
By Mark LaPedus - 15 Oct, 2013 - Comments: 0

Better Beer Rice University has devised a polymer material that could boost the properties of natural gas, beer and soda. By adding modified, single-atom-thick graphene nanoribbons (GNRs) to thermoplastic polyurethane (TPU), Rice’s polymer material could make it more practical for vehicles to run on compressed natural gas. The material is far more impermeable to pressurized gas and lighte... » read more

The Week In Review: Oct. 11
By Mark LaPedus - 11 Oct, 2013 - Comments: 0

By Mark LaPedus & Ed Sperling Demand is running high for DRAMs, thanks to last month’s fab fire at Hynix’ China plant. “The impact from Hynix' fab fire seems to be far more extensive than we had originally thought. We now think the factory is most likely up at the earliest by May/June 2014, which certainly provides robust pricing support for DRAM. Hynix is in the process of convertin... » read more

Manufacturing Bits: Oct. 8
By Mark LaPedus - 08 Oct, 2013 - Comments: 0

X-Ray Vision Researchers led by the University of Manchester have developed a new type of X-ray vision. The technology can look inside objects and map the properties in 3D and in real time. This technology is called pair distribution function-computed tomography. Applications include materials science, biomaterials, geology, environmental science and palaeontology. The technology enable... » read more

The Week In Review: Oct. 4
By Mark LaPedus - 04 Oct, 2013 - Comments: 0

By Mark LaPedus & Ed Sperling eSilicon introduced an automated multi-project wafer quote system, which allows companies to sort through a number of options and get pricing. The quotes are tied into TSMC's 20nm to 350nm processes, and GlobalFoundries’ 20nm to 180nm processes. The approach eliminates the need for companies to buy a full wafer if their volume requirements don’t warrant it... » read more

← Older posts Newer posts →

  • Sponsors

About

Navigation

Connect With Us

Copyright ©2013-2026 SMG   |  Terms of Service  |  Privacy Policy