When Order Matters


Do you brush your teeth before dinner? Put on your shoes before going to bed? Iron your clothes before you wash them? Okay, forget that last one. No one irons clothes anymore…do they? Anyway, my point is, if you want to achieve the best results from a process, order can be really important. And so it is with double patterning (DP) error debugging. As I’ve discussed, there are many types ... » read more

Amazing New Materials


Materials are fundamental to active photonics devices, and there were plenty of developments discussed at Photonics West 2014. Element Six was happy to talk about progress in making large single-crystal diamond and even larger polycrystalline diamond wafers. Carbon has a number of stable forms; diamond, graphite, nanotubes and amorphous carbon. The Element Six process uses CVD conditions in ... » read more

Advanced Lithography: Moore’s Law Moves On


Every February, experts in nano patterning technologies converge in San Jose, Calif., to present their road maps, brainstorms and results at the SPIE Advanced Lithography Symposium. This year, there was more confusion than ever, partly the result of sessions in unlabeled (but beautiful) new ballrooms at the Convention Center, but mostly because of industry divergences. There is no longer a s... » read more

Smarter Lights


New products targeting the emerging Smart Home Automation market are popping up every day. There are smart locks, smart thermostats, smart refrigerators, smart mirrors, and the list just goes on and on. Sooner or later, we, as consumers, will have to determine how all this smart technology will enter our homes. What will be the main gateway providing access to all this Smart Home Automation?... » read more

Amazing New Chips


Biosystems such as artificial organs, analytical systems and all sorts of component technologies were front and center at Photonics West 2014 in San Francisco.  At this annual celebration of all things optical there were hordes (27K !) of nerds and hundreds of papers. One of the challenges is just picking which papers to listen to, and then which to talk about. One eye-catching subject was ... » read more

A Milestone In Imprint Lithography


The announcement on Feb. 13 of the acquisition of the semiconductor arm of Molecular Imprints (MII) by Canon is a seminal event in the story of imprint patterning. Full disclosure requires me to mention that as a founding team member at Molecular Imprints, my founders shares are now worth something — but well short of not needing to write a free blog as a marketing exercise for my consulting ... » read more

Driving Innovation: From Talk to Action


During the recent SEMI Industry Strategy Symposium, one of the themes focused on the challenges of building an innovative workforce with fresh ideas. KLA CEO and president Rick Wallace’s opening keynote address included an appeal for industry to actively recruit more young talent to foster greater levels of innovative thinking. He said that only four percent of the U.S. workforce is compos... » read more

New Rules For DRAM


By Jim Feldhan DRAM revenues grew by more than 30% in 2013. Average selling prices increased more than 45% as capacity constraints especially for LPDRAM, motivated the transition from 2GB density parts up to 4GB DRAM units declined by almost 10%. Revenue growth rates of more than 30% combined with a declining unit base are not new to the memory market. But 2013 was a pivotal year for DRAM. ... » read more

Does It Take A Catastrophe?


What makes a company search for new verification methods and tools? Sometimes organizations change, proactively, because they are wise and want to avoid problems; but sadly, more often it is a catastrophe that forces change. This was the case with a large U.S. supplier of safety-critical and high-reliability ICs. After a failed chip, it finally moved from simply verifying the analog and digi... » read more

Lithography-Enabled Scaling Challenges


The semiconductor industry is being challenged as never before when it comes to lithography-enabled scaling. While development of new patterning techniques and resists as well as inspection and metrology capabilities have helped device scaling advance, major issues continue to challenge the future of Moore’s Law. There’s an industry shift from lithography-enabled 2D devices to materials-ena... » read more

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