Putting The Brakes On Consolidation


China's efforts to reduce its trade deficit by acquiring technology outside of its borders—particularly in the areas of process technology and memory—are hitting some snags. Any proposed acquisitions are being closely monitored by government agencies around the globe, and in many cases they have been quietly derailed. The Committee on Foreign Investment in the United States (CFIUS) is pa... » read more

5 Takeaways From ISS


At the recent Industry Strategy Symposium (ISS) in Half Moon Bay, Calif., there were a multitude of presentations on a number of subjects. The event, sponsored by SEMI, had presentations on the outlook for ICs and equipment. It also discussed the latest business and technology trends. In no particular order, here are my five takeaways from ISS: Bullish outlook Citing an inventory corre... » read more

Transferring Skills Getting Harder


Rising complexity in developing chips at advanced nodes, and an almost perpetual barrage of new engineering challenges at each new node, are making it more difficult for everyone involved to maintain consistent skill levels across a growing number of interrelated technologies. The result is that engineers are being forced to specialize, but when they work with other engineers with different ... » read more

What’s Up MEMS?


Strong segment growth. A whole slew of new devices on the horizon. A healthy pipeline of enabling critical problems to be solved. Has somebody been peeking at my Christmas list? Possibly yes, and thankfully so, because 2016 has been that kind of year in MEMS. Taking a look at the numbers from Yole Developpement, they expect 2016 MEMS device segment revenue to be around $13B, with an estimate... » read more

China Factors Heavily In Policy And Business Considerations


The year begins with intensified attention to China’s rapid semiconductor industry growth, which was a central theme of the recent SEMI Industry Strategy Symposium (ISS) and also weighed heavily in a new report from a Presidential advisory council. Speaking at the SEMI Industry Strategy Symposium (ISS), Handel Jones, CEO of International Business Strategies (IBS), forecast the global sem... » read more

Inside Photomask Writing


Hirokazu Yamada, a board member and the director of the Mask Lithography Division of NuFlare, sat down with Semiconductor Engineering to discuss photomask technology, e-beam mask writer trends and other topics. NuFlare is the world’s largest supplier of e-beam mask writers. What follows are excerpts of that conversation. SE: How does the [getkc id="265" kc_name="photomask"] market look in... » read more

China Unveils Memory Plans


Backed by billions of dollars in government funding, China in 2014 launched a major initiative to advance its domestic semiconductor, IC-packaging and other electronic sectors. So far, though, the results are mixed. China is making progress in IC-packaging, but the nation’s efforts to advance its domestic logic and memory sectors are still a work in progress. In fact, China has yet to achi... » read more

Accuracy In Optical Overlay Metrology


By Barak Bringoltz, Tal Marciano, Tal Yaziv, Yaron DeLeeuw, Dana Klein, Yoel Feler, Ido Adam, Evgeni Gurevich, Noga Sella, Ze’ev Lindenfeld, Tom Leviant, Lilach Saltoun, Eltsafon Ashwal, Dror Alumot and Yuval Lamhot, Xindong Gao, James Manka, Bryan Chen, and Mark Wagner. Abstract In this paper we discuss the mechanism by which process variations determine the overlay accuracy of optical m... » read more

Standardizing Platforms From Characterization To Production


In 1983, the first commercial mobile phone retailed for $3995, almost $10,000 in today’s economy. It supported a single band, weighed almost a kilogram, and was about the size of a brick. Two decades later, a quad-band “world phone” costs a few hundred dollars. Even a basic mobile phone that supports over 20 cellular bands, in addition to Bluetooth, Wireless LAN, and GPS technology, ... » read more

FinFET And Multi-Patterning Aware Place-And-Route Implementation


The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical verification and describes how the Nitro-SoC place and route system handles them. To read more, click here. » read more

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