New Wafer-Like And Reticle-Like Sensors Deliver Fast, Easy Measurements Inside The Process Chamber


Setup and maintenance operations for semiconductor manufacturing tools can be tedious, time-consuming, and expensive, incurring both direct costs for personnel and resources and indirect costs for lost tool time during extended commissioning of new tools and requalification of repaired or serviced tools. Wafer-like (and reticle-like) sensors (WaferSense® from CyberOptics) provide fast, easy ac... » read more

Standards: The Next Step For Silicon Photonics


Testing silicon photonics is becoming more critical and more complicated as the technology is used in new applications ranging from medicine to cryptography, lidar, and quantum computing, but how to do that in a way that is both consistent and predictable is still unresolved. For the past three decades, photonics largely has been an enabler for high-speed communications, a lucrative market t... » read more

How The Doubling Of Interconnect Bandwidth With PCI Express 6.0 Impacts IP Electrical Validation


As a result of the innovations taking place in CPUs, GPUs, accelerators, and switches, the interface in hyperscale datacenters now requires faster data transfers both between compute and memory and onto the network. PCI Express (PCIe®) provides the backbone for these interconnects and is used to build protocols such as Computer Express Link (CXL™) and Universal Chiplet Interconnec... » read more

A Journey Of Innovation


When Dr. Shay Wolfling, a physics expert, joined Nova as its CTO about 11 years ago, very little about the company was the same as it is today. Over the past decade, Nova has experienced tremendous growth, acquiring two companies, significantly increasing its revenue and employee count, and shifting its technology direction and product lines. Yet, one constant remains: commitment to innovation ... » read more

Epi SiGe Application Using METRION In-Line SIMS System


The epitaxial process is a well-established deposition technique in semiconductor fabrication because it enables the ability to achieve much higher doping concentrations than can be obtained via ion implantation. As we move toward <5nm technology, a key process for enabling gate-all-around FET (GAAFET) is the stacked multi-lattice of Silicon (Si) and Silicon-germanium (SiGe) epi process for ... » read more

Ion Implantation Applications For In-Line SIMS Metrology


By Wei Ti Lee, Sarah Okada, Lawrence Rooney, Feng Zhang, and Benjamin Hickey In the semiconductor industry, ion implantation process has expanded to a wide range of applications with doses and energies spanning several orders of magnitude. Ion implantation is a very complicated process with many parameters and factors that affect the implant profile. For example, shadowing effects from high... » read more

Zero Trust Security In Chip Manufacturing


More equipment vendors and more IP are making the data in a fab much more valuable than in the past, and a potential target for hackers. What’s needed is a different approach to architecting and deploying services and equipment, so breaches can be stopped before they affect other equipment and data, and a better way of sharing data. Brian Buras, production analytics solution architect at Adva... » read more

Using Machine Learning To Automate Debug Of Simulation Regression Results


Regression failure debug is usually a manual process wherein verification engineers debug hundreds, if not thousands of failing tests. Machine learning (ML) technologies have enabled an automated debug process that not only accelerates debug but also eliminates errors introduced by manual efforts. This white paper discusses how verification engineers can more efficiently analyze, bin, triage... » read more

Mechanical Characterization Of Ultra Low-k Dielectric Films


Dielectric materials are of critical importance in the function of microelectronic devices because they electrically isolate conductive components from one another in microcircuits. Capacitance between conductors can limit a circuit’s maximum operating frequency, and the capacitance increases in inverse proportion to the separation distance between the conductors. Therefore, to minimize the s... » read more

Ion Implantation Applications For In-Line SIMS Metrology


In the semiconductor industry, ion implantation process has expanded to a wide range of applications with doses and energies spanning several orders of magnitude. Ion implantation is a very complicated process with many parameters and factors that affect the implant profile. For example, shadowing effects from higher aspect ratio of photoresist opening, ion channeling or de-channeling effect... » read more

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