category: Top Stories

category: IoT, Security & Automotive

Full Coverage Or Full Monty
By Brian Bailey - 22 Jun, 2015 - Comments: 0

Without adequate coverage metrics and tools, verification engineers would never be able to answer the proverbial question: are we done yet? But a lot has changed in the design flow since the existing set of metrics was defined. Does it still ensure that the right things get verified, that time is not wasted on things deemed unimportant or a duplication of effort, and can it handle today’s hie... » read more

Litho Challenges Break The Design-Process Wall
By Katherine Derbyshire - 22 Jun, 2015 - Comments: 3

The days when chip designers could throw tape “over the wall” to the manufacturing side are long gone. Over the last several technology generations, increasingly restrictive process kits have forced designers to accommodate their circuit structures to the manufacturing process. Lacking a successor to 193nm lithography, the industry has turned to increasingly complex resolution enhancemen... » read more

Is EUV Making Progress?
By Ann Mutschler - 18 Jun, 2015 - Comments: 4

By Ann Steffora Mutschler & Ed Sperling EUV has been promised for a couple of decades, counted on for at least three process nodes on the ITRS roadmap, and considered essential to chip manufacturing since 22nm. Billions of dollars have been invested in R&D, engineering teams from around the world have contributed to its development, and still serious problems persist. Just how close... » read more

Foundries Expand Planar Efforts
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Competition is heating up in the leading-edge foundry business, as vendors begin to ramp up their new 16nm/14nm finFET processes. But that’s not the only action in the foundry arena. They are also expanding their efforts in the leading-edge planar market by rolling out new 28nm and 22nm processes. On one front, TSMC is offering new 28nm variants, based on bulk CMOS technology. And on an... » read more

Getting Over Overlay
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Chipmakers continue to migrate to the next node, but there are signs that traditional IC scaling is slowing down. So what’s causing the slowdown? Or for that matter, what could ultimately undo [getkc id="74" comment="Moore's Law"]? It could be a combination of factors. To be sure, IC design costs and complexity are soaring at each node. Scaling challenges are also playing a role. And ov... » read more

3 Ways To Reload Moore’s Law
By Michael Watts - 18 Jun, 2015 - Comments: 1

The electronics revolution has been enabled because the cost and power per transistor has decreased 30% per year for the last 30 years — a fact usually associated with Moore's Law. This has been accomplished by simply reducing the transistor size while offsetting increased costs of equipment and mask levels, and by increased productivity from improved yield, throughput and wafer size. This... » read more

Speeding Up E-beam Inspection
By Mark LaPedus - 18 Jun, 2015 - Comments: 0

Wafer inspection, the science of finding killer defects in chips, is reaching a critical juncture. Optical inspection, the workhorse technology in the fab, is being stretched to the limit at advanced nodes. And e-beam inspection can find tiny defects, but it remains slow in terms of throughput. So to fill the gap, the industry has been working on a new class of multiple beam e-beam inspectio... » read more

Power Verification Now Required
By Ann Mutschler - 17 Jun, 2015 - Comments: 0

Today’s verification tasks may seem daunting — and much of it is — but all of it is absolutely necessary to make sure chips operate properly with a larger system. Throw power into the mix and the challenges mount. The good news is that there is no shortage of tools and methodologies to help with these tasks. The bad news is that even the best tools won’t make the challenges disappear... » read more

Managing Dynamic Power
By Ann Mutschler - 16 Jun, 2015 - Comments: 0

Working with finFETs is a study in contrasts. While leakage is now under control for the first time in several process generations due to the advent of different gate technology, dynamic power density caused by tightly packed transistors and higher clock speeds has become the big issue. “FinFET technology helps with reducing static/leakage power so when your logic is not active, you can sh... » read more

SoC Integration Headaches Grow
By Ed Sperling - 16 Jun, 2015 - Comments: 0

As the number of IP blocks grows, so do the headaches of integrating the various pieces and making sure they perform as planned within a prescribed power envelope. This is easier said than done, particularly at the most advanced process nodes. There are more blocks, more power domains, more states and use-model dependencies, and there is much more contention for memories. There are physical ... » read more

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