Mask-wafer co-optimization for faster curvilinear ILT.
This talk by Leo Pang, Chief Product Officer of D2S, takes a look at a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO) that enables writing curvilinear ILT for 193i on VSB or multi-beam machines in 12 hours.
 |
 |
 |
 |
 |
 |
 |  |
Leave a Reply