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High-NA EUVL: the next major step in lithography

Progress obtained in developing the patterning processes, metrology and photomasks needed for enabling the high-NA EUV lithography infrastructure

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“In the course of 2025, we expect to see the introduction of the first high-NA extreme ultraviolet (EUV) lithography equipment in high-volume manufacturing environments.

These next-generation lithography systems will be key to advance Moore’s Law towards the logic 2nm technology generation and beyond.

In this article, imec scientists and engineers involved in preparing this major engineering project talk (in partnership with ASML) about challenges and opportunities. They highlight recent insights and progress obtained in developing the patterning processes, metrology and photomasks needed for enabling the high-NA EUV lithography infrastructure.”

Find the technical paper link here.



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