Increased Photomask Density And Its Impact On EDA

Why curvilinear shapes can simplify design rules for chip manufacturing.


The ability to print curvilinear shapes on photomasks can have big repercussions on semiconductor design. Aki Fujimura, CEO of D2S, explains why mask rule checking has been bound by complex design rules, and why curvilinear shapes are important for reducing margin and simplifying the chip design process.

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