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Scalable Approach For Fabricating Sub-10nm Nanogaps

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A new technical paper titled “A progressive wafer scale approach for Sub-10 nm nanogap structures” was published by researchers at Seoul National University, Chung-Ang University, Mohammed VI Polytechnic University and Ulsan National Institute of Science and Technology.

“We have advanced the atomic layer lithography method into an efficient, scalable approach for fabricating sub-10 nm nanogaps with high uniformity across entire wafer areas,” states the paper.

Find the technical paper here. April 2025.

Cha, J., Lee, G., Lee, D. et al. A progressive wafer scale approach for Sub-10 nm nanogap structures. Sci Rep 15, 11323 (2025). https://doi.org/10.1038/s41598-025-96200-6.



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