tag: 7nm

Why Test Costs Will Increase
By Ed Sperling - 08 Oct, 2018 - Comments: 0

The economics of test are under siege. Long seen as a necessary but rather mundane step in ensuring chip quality, or a way of testing circuitry from the inside while it is still in use, manufacturers and design teams have paid little attention to this part of the design-through-manufacturing flow. But problems have been building for some time in three separate areas, and they could have a b... » read more

Thermal Impact On Reliability At 7/5nm
By Ed Sperling - 28 Sep, 2018 - Comments: 0

Haroon Chaudhri, director of RedHawk Analysis Fusion at Synopsys, talks about why thermal analysis is shifting left in the design cycle and why this is so critical at the most advanced process nodes. https://youtu.be/wjkrEFLb2vY » read more

What Will Intel Do Next?
By Ed Sperling - 27 Sep, 2018 - Comments: 2

The writing is on the wall for big processor makers. Apple, Amazon, Facebook and Google are developing their own processors. In addition, there are more than 30 startups developing various types of AI accelerators, as well as a field of embedded FPGA vendors, a couple of discrete FPGA makers, and a slew of soft processor cores. This certainly hasn't been lost on Intel. As the world's largest... » read more

56G 7nm SerDes: Eyewitness Account
By Mike Gianfagna - 27 Sep, 2018 - Comments: 0

High-performance SerDes represents critical enabling technology for advanced ASICs. This star IP block finds application in many networking and switching designs as well as other high-performance applications. So, when a new high-performance SerDes block hits the streets, it’s real news. eSilicon has been enjoying the spotlight on such an event. We recently announced silicon validation of our... » read more

EUV Pellicle, Uptime And Resist Issues Continue
By Mark LaPedus - 26 Sep, 2018 - Comments: 0

Extreme ultraviolet (EUV) lithography is moving closer to realization, but several problems involving scanner uptime, photoresists and pellicles need to be resolved before this long-overdue technology is put into full production. Intel, Samsung and TSMC are hoping to insert EUV into production at 7nm and/or 5nm. While the remaining issues don’t necessarily pre-empt using EUV, they do affec... » read more

Advanced Defect Inspection Techniques For nFET And pFET Defectivity At 7nm Gate Poly Removal Process
By KLA - 20 Sep, 2018 - Comments: 0

By Ian Tolle, GlobalFoundries, and Michael Daino, KLA-Tencor During 7nm gate poly removal process, polysilicon is removed exposing both NFET and PFET fins in preparation for high-k gate oxide. If the polysilicon etch is too aggressive or the source and drain are not sufficiently protected, the etch can damage the active region and render the FET inoperative. Different materials are used in t... » read more

Electromagnetic Analysis and Signoff: Cost Savings
By Magdy Abadir - 18 Sep, 2018 - Comments: 0

By Nikolas Provatas and Magdy Abadir We are often asked by SoC design teams about the benefits of an electromagnetic analysis and signoff methodology. Here is an overview of some of the big “cost savings”. Time to Market Savings Utilizing an EM crosstalk analysis and signoff methodology provides designers with an “insurance policy” against the risk of EM coupling in their SOC des... » read more

Survey: EUV Optimism Grows
By Mark LaPedus - 17 Sep, 2018 - Comments: 2

The confidence level remains high for extreme ultraviolet (EUV) lithography, although the timing of the insertion remains a moving target, according to a new survey released by the eBeam Initiative. At the same time, the outlook for the overall photomask industry is bullish, according to the survey. On the downside, however, there appears to be no progress in terms of improving mask turnaro... » read more

Designers Face Growing Problems With On-Chip Power Distribution
By Marc Swinnen - 13 Sep, 2018 - Comments: 0

The technology evolution in semiconductor manufacturing has led to chips with ever-higher power densities, which is leading to serious problems with on-chip power distribution. Specifically, the problems surrounding voltage drop—or IR drop (from V=IxR)—have become so acute that we have seen multiple companies starting to get back dead silicon from the fab. For example, a recent 7nm chip ... » read more

Process Corner Explosion
By Ann Mutschler - 13 Sep, 2018 - Comments: 1

The number of corners that need to be checked is exploding at 7nm and below, fueled by everything from temperature and voltage to changes in metal. Lowering risk and increasing predictability of an SoC at those nodes starts with understanding what will happen when a design is manufactured on a particular foundry process, captured in process corners. This is basically a way of modeling what i... » read more

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