tag: Coventor

Defect Evolution In Next-Generation Extreme Ultraviolet Lithography
By Coventor - 21 Sep, 2016 - Comments: 0

Extreme ultraviolet (EUV) lithography is a promising next generation lithography technology that may succeed optical lithography at future technology nodes. EUV mask infrastructure and manufacturing of defect-free EUV mask blanks is a key near term challenge in the use of EUV lithography. Virtual fabrication is a computerized technique to perform predictive, three dimensional modeling of sem... » read more

Faster Time To Yield
By Ed Sperling - 23 Aug, 2016 - Comments: 2

Michael Jamiolkowski, president and CEO of Coventor, sat down with Semiconductor Engineering to talk about ways improve yield ramp and optimize designs. What follows are excerpts of that conversation. SE: Why does it take so long to get a chip all the way through to manufacturing? Jamiolkowski: There are three parts to that. There is a research side. You want to be able to explore new th... » read more

Making Phones Better
By Mattan Kamon - 18 Aug, 2016 - Comments: 0

Beneath a smartphone's slick packaging is some interesting, highly sophisticated technology that makes the user experience what it is today. Much of that experience relies on satisfying our ever growing desire for more data capacity for video, social media and the like. Providing that capacity relies on robust filtering to receive just your data stream amongst many nearby other streams. But tha... » read more

What Transistors Will Look Like At 5nm
By Mark LaPedus - 18 Aug, 2016 - Comments: 3

Chipmakers are currently ramping up 16nm/14nm finFET processes, with 10nm and 7nm just around the corner. The industry also is working on 5nm. TSMC hopes to deliver a 5nm process by 2020. GlobalFoundries, Intel and Samsung are doing R&D for that node. But 5nm technology presents a multitude of unknowns and challenges. For one thing, the exact timing and specs of 5nm remain cloudy. The... » read more

Back-End-of-Line (BEOL) Virtual Patterning With SEMulator3D
By Coventor - 17 Aug, 2016 - Comments: 0

Interconnect requirements for the 22nm technology node and beyond, driven by shrinking FEOL geometry, push the limits of unit process tools for BEOL as well as FEOL. Lengthy and costly in-fab experiments are required to ensure that the integrated BEOL process meets local performance and cross-wafer uniformity requirements. Virtual fabrication experiments conducted with SEMulator3D can reduce th... » read more

Pattern Dependence Process Modeling
By Joseph Ervin - 21 Jul, 2016 - Comments: 0

First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” prior to actual fabrication. In some instances, a deeper level of complexity needs to be added to the process model to capture the effects of variation in the process. Specific examples inclu... » read more

Virtual Fabrication For MEMS Process Development
By Coventor - 20 Jul, 2016 - Comments: 0

MEMS fabrication and design are closely coupled, such that design changes could significantly alter the process flow and vice versa. For instance, setting device parameters such as drive capacitance, deflection distance, or proof mass size directly affects the choice of film thickness, etch rate, sidewall profile and so forth. Typically, this requires multiple iterations of the MEMS design/proc... » read more

Atomic Layer Etch Heats Up
By Mark LaPedus - 29 Jun, 2016 - Comments: 0

The atomic layer etch (ALE) market is starting to heat up as chipmakers push to 10nm and beyond. ALE is a promising next-generation etch technology that has been in R&D for the last several years, but until now there has been little or no need to use it. Unlike conventional etch tools, which remove materials on a continuous basis, ALE promises to selectively and precisely remove targete... » read more

Blog Review: June 29
By Jesse Allen - 29 Jun, 2016 - Comments: 0

Ansys' Justin Nescott checks out the world's first electric highway for trucking in this week's top five tech picks. Plus, some cool houses, Boston Dynamics' giraffe-bot, and a drum kit in a backpack. Applied's Matt Cogorno takes a look at the challenges facing etch methods as devices keep getting smaller. Synopsys' Apoorva Mathur digs into the energy efficient aspects of the MIPI M-PHY a... » read more

Interconnect Challenges Rising
By Mark LaPedus - 27 Jun, 2016 - Comments: 1

Chipmakers are ramping up their 14nm finFET processes, with 10nm and 7nm slated to ship possibly later this year or next. At 10nm and beyond, IC vendors are determined to scale the two main parts of the [getkc id="185" kc_name="finFET"] structure—the transistor and interconnects. Generally, transistor scaling will remain challenging at advanced nodes. And on top of that, the interconnects ... » read more

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