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Using GPUs In Semiconductor Manufacturing


Massive simulation and curvilinear shapes are forcing the photomask industry to rethink what types of chips work best. Aki Fujimura, CEO of D2S, talks about what happens when shapes printed on a mask are closer to what actually gets printed, how GPUs can be used to accelerate CPUs in single instruction/multiple data (SIMD) operations, and why pixel data is different from other data. » read more

The Benefits Of Curvilinear Shapes On Photomasks


Do you have four minutes to hear why companies like Micron Technology think that curvilinear shapes on photomasks are an advantage? In a short video, Ezequiel Russell, Senior Director of Mask Technology at Micron Technology shows how curvilinear shapes can increase process windows for advanced memory as shown in figure 1. The video was part of a longer panel discussion with industry experts at ... » read more

Big Changes In Patterning


Aki Fujimura, CEO of [getentity id="22864" comment="D2S"], sat down with Semiconductor Engineering to discuss patterning issues at 10nm and below, including mask alignment, the need for GPU acceleration, EUV's future impact on the total number of masks, and what the re-introduction of curvilinear shapes will mean for design. SE: Patterning issues are getting a lot of attention at 10nm and 7n... » read more