Why Changes In Computing Are Driving Changes In Photomasks

How different photomask shapes can improve semiconductor reliability and performance.


Aki Fujimura, CEO of D2S, talks with Semiconductor Engineering about massive improvements in computation based upon increased density on chips, and why printing Manhattan shapes on a photomask are no longer sufficient to print high-performance devices with predictable reliability every time. He explains why a discontinuity in EDA physical design has opened the door for printing curvilinear shapes on masks.

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