Using CAA And DFM Scoring To Improve Manufacturing Success


Critical area analysis and design for manufacturing scoring both offer designers actionable information they can use to improve their designs to prevent low-yield issues in the foundry. At the same time, they provide the foundry with information they can use for process improvement. Learn how fabless designers, foundries, and integrated device manufacturers can all benefit from addressing manuf... » read more

Chipping Away At Functional Safety Flaws In Automotive Electronics


Today’s automobiles are packed with electronics. From autonomous driving support and infotainment systems to mission-critical functions like braking, a car’s performance depends on the reliability of these electronics systems. While the semiconductors that lie at the heart of these systems have been not been a focus in the past, today their reliability is coming under closer scrutiny by bot... » read more

E-beam Inspection Makes Inroads


E-beam inspection is gaining traction in critical areas in fab production as it is becoming more difficult to find tiny defects with traditional methods at advanced nodes. Applied Materials, ASML/HMI and others are developing new e-beam inspection tools and/or techniques to solve some of the more difficult defect issues in the fab. [gettech id="31057" t_name="E-beam"] inspection is one of tw... » read more

Measuring ISO 26262 Metrics Of Analog Circuitry In ICs


The goals for automotive electronics are zero defective parts per million (0 DPPM), and safe operation during the expected lifetime of the vehicle. The ISO 26262 standard provides procedures and metrics required before delivery to ensure systems can be expected to operate without unreasonable risk. ISO 26262 specifies circuit metrics and minimum values that are design requirements. Since the... » read more

Process Window Discovery And Control


With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design node and beyond. They also are investing significant development effort in readying EUV lithography for production at the 7/5nm design nodes. Additionally, semiconductor manufacturers’ use of desi... » read more

Nontraditional Post Develop Inspection And Review Strategy For Via Defects


A viable in-line monitor for missing vias in the back end of line (BEOL) has traditionally been challenging due to the nature of the defects. Today’s available solutions do not meet the requirements of a true in-line and at-level monitor strategy. These solutions either indirectly monitor the defect further down the line, put production at risk of damage or contamination due to exceeding stri... » read more

Searching For EUV Mask Defects


Chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm, but several challenges need to be solved before this technology can be used in production. One lingering issue that is becoming more worrisome is how to find [gettech id="31045" comment="EUV"] mask defects. That isn't the only issue, of course. The industry continues to work on the power source and resists. Bu... » read more

Devices Threatened By Analog Content?


As the amount of analog content in connected devices explodes, ensuring that the analog portion works properly has taken on a new level of urgency. Analog circuitry is required for interpreting the physical world and for moving data to other parts of the system, while digital circuitry is the fastest way to process it. So a sensor that gives a faulty reading in a car moving at high speed or ... » read more

Power/Performance Bits: Oct. 4


Solar battery Chemists at the University of Wisconsin–Madison and the King Abdullah University of Science and Technology in Saudi Arabia integrated solar cells with a large-capacity battery in a single device that eliminates the usual intermediate step of making electricity and, instead, transfers the energy directly to the battery's electrolyte. The team used a redox flow battery, or R... » read more

New Drivers For Test


Mention Design for Test (DFT) and scan chains come to mind, but there is much more to it than that—and the rules of the game are changing. New application areas such as automotive may breathe new life into built-in self-test (BIST) solutions, which could also be used for manufacturing test. So could DFT as we know it be a thing of the past? Or will it continue to have a role to play? Te... » read more

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